研究目的
To create a model of a microaccelerometer using MEMS technology and investigate its sensitivity and non-linear properties in the commercial temperature range.
研究成果
The MEMS accelerometer with SAW demonstrates good linearity in output characteristics, with a sensitivity of 360 Hz/(m/s2), acceleration range of -12 to +12 m/s2, and operating frequency of 450 MHz. It is suitable for use in inertial motion control systems for UAVs or underwater ROV/AUVs, with recommendations for future improvements in manufacturing accuracy and material quality.
研究不足
The accuracy of manufacturing the interdigital electrode topology and the quality of the piezosemiconductor film can influence the characteristics, with frequency tuning variations from ±60 kHz to ±130 kHz. The operating temperature range is limited to 0-60°C, and nonlinearity of the output characteristic is 2%.
1：Experimental Design and Method Selection:
The study involved creating a MEMS accelerometer model using planar silicon technology on a Si-SiO2-ZnO structure, with mathematical simulation based on numerical solutions of mechanical equations to estimate frequency shifts and resonance frequencies. A differential switching circuit for SAW delay lines was used to minimize temperature effects.
2：Sample Selection and Data Sources:
The MEMS sensor was fabricated on a silicon wafer with specific materials and dimensions, and data were collected from experimental measurements on a centrifuge for calibration.
3：List of Experimental Equipment and Materials:
Silicon wafer, SiO2, ZnO thin film (1.5 μm thickness), Cr for electrodes, KOH solution for etching, electron-beam evaporation system, laser-stimulated etching equipment, centrifuge for calibration, AFM for surface analysis, X-ray for structural investigations.
4：5 μm thickness), Cr for electrodes, KOH solution for etching, electron-beam evaporation system, laser-stimulated etching equipment, centrifuge for calibration, AFM for surface analysis, X-ray for structural investigations.
Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: The ZnO thin film was deposited by reactive magnetron sputtering, backside etching in KOH to 50 μm thickness, formation of electrodes and absorption regions using electron-beam evaporation and laser-stimulated etching, topology formation with micro-dimensional laser treatment, and calibration using a centrifuge to measure frequency shifts under acceleration.
5：Data Analysis Methods:
Numerical solution of mechanical equations (1)-(8) for simulation, analysis of frequency shifts and resonance frequencies, and plotting of output characteristics from experimental data.
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