研究目的
To compare the growth dynamics and tribological properties of nanocrystalline diamond films deposited on (110) single crystal diamond and Si(100) substrates, and to understand the influence of substrate on these properties.
研究成果
NCD films on SC(110) diamond and Si(100) substrates have similar chemical composition and crystal structure but differ in growth dynamics and tribological properties. Growth on SC(110) is unstable with anomalous scaling, influenced by shadowing and diffusional instabilities. Tribologically, both show similar COF (~0.14), but NCD/SC(110) has lower wear volumes, indicating substrate and interface properties affect behavior, with deflection likely in NCD/Si(100) systems.
研究不足
Unstable growth rate observed, varying between 0.07 and 0.18 μm/min. Difficulty in estimating growth exponent β due to data scatter. Anomalous scaling with high roughness exponent αs = 1.5–1.6 indicates non-local effects like shadowing and diffusional instabilities, which may limit control over film properties. Tribological tests were conducted in air with specific humidity (about 35%), which might not represent all environmental conditions. The study focuses on specific substrates and may not generalize to other materials.
1:Experimental Design and Method Selection:
NCD films were grown using Microwave Plasma Enhanced Chemical Vapor Deposition (MPCVD) in methane/hydrogen/nitrogen plasma. Tribological tests were conducted under reciprocating sliding conditions with varying loads and cycles. Scaling analysis was used to study growth dynamics.
2:Sample Selection and Data Sources:
HPHT (110) single crystal diamond substrates (3x4x1.5 mm plates from Euro Superabrasives Limited) and Si(100) substrates were used. Films of thicknesses 2.2, 8, 10.5, and 22.5 μm were prepared with growth times of 32, 54, 73, and 130 minutes.
3:5 mm plates from Euro Superabrasives Limited) and Si(100) substrates were used. Films of thicknesses 2, 8, 5, and 5 μm were prepared with growth times of 32, 54, 73, and 130 minutes. List of Experimental Equipment and Materials:
3. List of Experimental Equipment and Materials: MPCVD system (power 2.5 kW, pressure 80 Tr, temperature 1050–1100 °C), CETR UMT-2 tribometer, Si3N4 balls (REDHILL), AFM (Bruker MultiMode 8), SEM (Zeiss EVO MA-15 and Zeiss Merlin), stylus profilometer (Mahr Perthometer), micro-Raman setup (Renishaw inVia), XRD (Rigaku Ultima IV).
4:5 kW, pressure 80 Tr, temperature 1050–1100 °C), CETR UMT-2 tribometer, Si3N4 balls (REDHILL), AFM (Bruker MultiMode 8), SEM (Zeiss EVO MA-15 and Zeiss Merlin), stylus profilometer (Mahr Perthometer), micro-Raman setup (Renishaw inVia), XRD (Rigaku Ultima IV). Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: Films were deposited, thickness measured by mechanical fracture. Tribological tests: normal loads 0.5 and 2 N, displacement amplitude 1 mm, frequency 5 Hz, up to 72,000 cycles. Surface morphology analyzed with AFM and SEM, wear scars with profilometry, structure with Raman and XRD.
5:5 and 2 N, displacement amplitude 1 mm, frequency 5 Hz, up to 72,000 cycles. Surface morphology analyzed with AFM and SEM, wear scars with profilometry, structure with Raman and XRD. Data Analysis Methods:
5. Data Analysis Methods: Scaling exponents calculated from power spectral density (PSD) functions. Hertzian contact pressure calculated using method from Erdemir et al. Wear volumes and coefficients of friction analyzed statistically.
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Atomic Force Microscope
MultiMode 8
Bruker
Used for surface morphology analysis in non-contact mode.
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Scanning Electron Microscope
EVO MA-15
Zeiss
Used for imaging surface morphology in secondary electron mode.
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High-Resolution Scanning Electron Microscope
Merlin
Zeiss
Used for high-resolution topographic and compositional imaging.
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X-ray Diffractometer
Ultima IV
Rigaku
Used for XRD patterns to study crystal structure.
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Microwave Plasma Enhanced Chemical Vapor Deposition system
Not specified
Not specified
Used for growing nanocrystalline diamond films on substrates.
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Tribometer
UMT-2
CETR
Used for reciprocating sliding tests to evaluate tribological properties.
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Profilometer
Perthometer
Mahr
Used for measuring wear scars depth profiles.
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Micro-Raman Setup
inVia
Renishaw
Used for Raman spectroscopy to analyze chemical composition.
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Si3N4 Ball
Not specified
REDHILL
Used as counter body in tribological tests.
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Diamond Substrate
HPHT (110) single crystal
Euro Superabrasives Limited
Used as substrate for film deposition.
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