研究目的
To study the effects of thermal annealing on the structural and electrical properties of Zinc Tin oxide thin films for transparent conducting electrode applications.
研究成果
Amorphous as-deposited ZTO thin films exhibit better electrical properties with high electron mobility and low carrier concentration, making them suitable for transparent electrode applications. Annealing leads to crystallization, increased resistance, and sub-band gap level creation, reducing suitability without optimization.
研究不足
The study is limited to specific annealing temperatures and conditions; electrical properties of annealed films were not fully characterized due to high resistance, and oxygen concentration changes post-annealing were not focused on. Optimization for TCO applications requires further experimental tuning.
1:Experimental Design and Method Selection:
The study involved synthesizing Zn2SnO4 powder via solid-state reaction, depositing thin films using electron beam evaporation, and annealing them at various temperatures to investigate structural, optical, and electrical changes.
2:Sample Selection and Data Sources:
Si substrates were used for thin film deposition; samples included as-deposited and annealed films at 400°C, 500°C, and 600°C.
3:List of Experimental Equipment and Materials:
Equipment included Bruker D8 X-ray diffractometer, NanoscopeIIIa AFM, UV-Vis spectrophotometer, RBS setup with 2 MeV He+ ions, Ecopia Hall Measurement HMS 3000, and e-beam evaporation system. Materials included ZnO and SnO2 powders (AlfaAesar,
4:9% pure). Experimental Procedures and Operational Workflow:
Powder synthesis by grinding and sintering, substrate cleaning, thin film deposition with e-beam evaporation at
5:75 kV and 20 mA, annealing in air for 6 hours, followed by characterization using XRD, AFM, RBS, UV-Vis, Hall effect, and resistance measurements. Data Analysis Methods:
XRD data analyzed for crystallinity and size using Debye-Scherrer equation, AFM for grain size and roughness, RBS for thickness and composition with SIMNRA software, optical data for band gap via Tauc plot, and electrical data for conductivity and mobility.
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X-ray diffractometer
Bruker D8
Bruker
Used for structural characterization of ZTO powder and thin films to determine crystallinity and phase composition.
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Atomic Force Microscope
NanoscopeIIIa
Used for morphological study of thin films to observe grain size and surface roughness.
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UV-Vis spectrophotometer
Used for optical transmission and absorption measurements to determine band gap and transmission properties.
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Rutherford Back Scattering setup
Used for determining film thickness and elemental composition of as-deposited thin films.
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Hall Measurement system
HMS 3000
Ecopia
Used for measuring carrier concentration, mobility, and conductivity of as-deposited thin films.
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Electron beam evaporation system
Used for depositing ZTO thin films on Si substrates.
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ZnO powder
AlfaAesar
Precursor for synthesizing ZTO powder.
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SnO2 powder
AlfaAesar
Precursor for synthesizing ZTO powder.
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