研究目的
To fabricate large-area ordered robust colloidal crystal films for UV shielding and color filtering applications, maintaining high transparency and tunable photonic band gaps.
研究成果
The ultrathin CC-PVA photonic films effectively resist UV light with high transparency and tunable photonic band gaps, showing promise for UV shielding and color filtering applications. Future work could optimize thickness and defect control.
研究不足
The UV reflectance increases non-linearly with film thickness, and transmittance decreases, possibly due to increased defects and extinction phenomena. The method may have constraints in scalability or environmental stability.
1：Experimental Design and Method Selection:
A facile approach using self-assembly of PMMA colloids in PVA solution, cured to form photonic films. Theoretical models include Bragg's law for diffraction wavelength calculation.
2：Sample Selection and Data Sources:
Monodisperse PMMA latexes of various sizes (102 to 253 nm) prepared via emulsifier-free polymerization. PVA solution prepared in DMSO.
3：List of Experimental Equipment and Materials:
SEM (Hitachi S-4800), fiber optic spectrometer (Ocean Optics USB 4000-XR1-ES with DH-2000-BAL light source), UV photometer (LS-220), digital camera (Canon EOS 6D), quartz slides, PVA, PMMA, DMSO, RCA solution, ultrapure water.
4：Experimental Procedures and Operational Workflow:
PMMA colloids dialyzed and mixed with PVA solution, poured onto quartz slides, cured at 80°C to form films. SEM, reflection spectra, transmittance, and UV resistance tests conducted.
5：Data Analysis Methods:
Reflection spectra analyzed using Bragg's law, refractive index calculated, UV efficiency and transmittance measured statistically.
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Scanning Electron Microscope
S-4800
Hitachi
Structural and morphological characterization of the crystals
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Fiber Optic Spectrometer
USB 4000-XR1-ES
Ocean Optics
Measuring reflection spectra and integral visible transmittance
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Digital Camera
EOS 6D
Canon
Taking optical photographs
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UV Photometer
LS-220
Detecting UV light intensity for resistance tests
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