1：Experimental Design and Method Selection:

Pulsed laser deposition (PLD) was used with two modes: low deposition rate (LDR) from mixed B-diamond targets and high deposition rate (HDR) from dual B-graphite targets. UV (266 nm) and IR (1064 nm) laser wavelengths were employed for LDR and HDR, respectively, to achieve different deposition rates. Substrate temperature was set at 500 °C to activate chemical interactions while minimizing graphitization.

2：Sample Selection and Data Sources:

Films were deposited on Si and NaCl substrates. Composition and properties were analyzed using techniques like RBS, SEM, TEM, EELS, MRS, XPS, nanoindentation, and electrical measurements.

3：List of Experimental Equipment and Materials:

Equipment included Nd:YAG laser (LQ529, Belarus), SEM (Tescan LYRA 3), TEM (Carl Zeiss Libra 120), XPS (K-Alpha, Thermo Scientific), nanoindenter (Hysitron UBI750), cryostat (CryoFree404), and Langmuir probe. Materials included mixed B-diamond targets (B/D2.6 and B/D1.5), dual B-graphite target, Si and NaCl substrates, and InSn alloy for contacts.

4：6 and B/D5), dual B-graphite target, Si and NaCl substrates, and InSn alloy for contacts. Experimental Procedures and Operational Workflow:

4. Experimental Procedures and Operational Workflow: Targets were ablated with specific laser parameters (e.g., energy density 7 J/cm2 for LDR, 10 J/cm2 for HDR). Films were deposited for varying times (20-30 min for LDR, 4 min for HDR). Post-deposition, films were characterized for morphology, structure, composition, mechanical, and electrical properties.

5：Data Analysis Methods:

Data were analyzed using deconvolution for EELS and XPS spectra, intensity ratios for MRS, and standard formulas for electrical and mechanical properties. Statistical methods were applied for multiple measurements.