研究目的
To investigate the Ovonic threshold switching characteristics of polycrystalline zinc telluride thin films for use as selection devices in cross-point memory arrays.
研究成果
Polycrystalline ZnTe thin films exhibit excellent OTS characteristics with high selectivity, fast switching speed, thermal stability up to 400°C, and endurance over 109 cycles, making them promising for high-density cross-point memory arrays as selection devices. The deep trap density in these films is comparable to amorphous OTS alloys, contributing to the switching behavior.
研究不足
The exact nature of defects in ZnTe films remains unclear and requires further research. The study is limited to polycrystalline ZnTe and may not generalize to other materials or structures.
1:Experimental Design and Method Selection:
The study involved fabricating ZnTe thin films using RF magnetron sputtering and characterizing their physical and electrical properties to evaluate OTS behavior. Theoretical models such as the space-charge limited conduction model were employed to explain the switching mechanism.
2:Sample Selection and Data Sources:
ZnTe thin films were deposited on patterned tungsten substrates using a ZnTe compound single target. Samples were analyzed after deposition and post-annealing at various temperatures.
3:List of Experimental Equipment and Materials:
Equipment included an RF magnetron sputtering system, X-ray photoelectron spectroscopy (XPS, K-alpha, Thermo VG), Rutherford back scattering (RBS, National Electrostatics Corporation 5SDH-4), UV-visible spectroscopy (JASCO Corporation, V-650), transmittance electron microscopy (TEM, JEOL JEM-F200), photoluminescence (PL, LabRAM ARAMIS), X-ray diffraction (XRD, Rigaku Ultima IV), and an Agilent B1500A analyzer. Materials included high-purity Ar gas and ZnTe target.
4:Experimental Procedures and Operational Workflow:
Films were deposited at a base pressure of 10–7 torr, process pressure of 10?3 torr, and substrate temperature of 300 K. Chemical composition was analyzed by XPS and RBS. Optical band gaps were measured via UV-vis spectroscopy, crystallinity by XRD and GI-XRD, and electrical properties by I-V measurements with a two-probe contact. Post-annealing was done at 200, 300, and 400°C for 30 min. AC pulse tests were conducted for switching speed and endurance.
5:Data Analysis Methods:
Data were analyzed using methods such as Tauc plot for band gap estimation, SCLC model for conduction analysis, and statistical analysis for device variability.
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X-ray photoelectron spectroscopy
K-alpha
Thermo VG
Determination of chemical compositions
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UV-visible spectroscopy
V-650
JASCO Corporation
Measurement of transmittance and optical band gaps
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Transmittance electron microscopy
JEM-F200
JEOL
Confirmation of film thickness
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X-ray diffraction
Ultima IV
Rigaku
Investigation of crystallinity
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Device analyzer
B1500A
Agilent
Measurement of electrical properties
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RF magnetron sputtering system
Deposition of ZnTe thin films
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Rutherford back scattering
5SDH-4
National Electrostatics Corporation
Non-destructive analysis of chemical composition ratio
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Photoluminescence
LabRAM ARAMIS
Measurement of PL spectra
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Waveform generator fast measurement unit
WGFMU
AC endurance testing
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