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oe1(光电查) - 科学论文

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?? 中文（中国） ▾

  • Electrical characterization of high k-dielectrics for 4H-SiC MIS devices

    摘要： We report promising results regarding the possible use of AlN or Al2O3 as a gate dielectric in 4H-SiC MISFETs. The crystalline AlN ?lms are grown by hot wall metal organic chemical vapor deposition (MOCVD) at 1100 °C. The amorphous Al2O3 ?lms are grown by repeated deposition and subsequent low temperature (200 °C) oxidation of thin Al layers using a hot plate. Our investigation shows a very low density of interface traps at the AlN/4H-SiC and the Al2O3/4H-SiC interface estimated from capacitance-voltage (CV) analysis of MIS capacitors. Current-voltage (IV) analysis shows that the breakdown electric ?eld across the AlN or Al2O3 is ～ 3 MV/cm or ～ 5 MV/cm respectively. By depositing an additional SiO2 layer by plasma enhanced chemical vapor deposition at 300 °C on top of the AlN or Al2O3 layers, it is possible to increase the breakdown voltage of the MIS capacitors signi?cantly without having pronounced impact on the quality of the AlN/SiC or Al2O3/SiC interfaces.

    关键词： MIS structure,Interface traps,Al2O3/4H-SiC interface,AlN/4H-SiC interface

    更新于2025-11-14 17:28:48

  • Electrical properties of 4H-SiC MIS capacitors with AlN gate dielectric grown by MOCVD

    摘要： We report on the electrical properties of the AlN/4H-SiC interface using capacitance- and conductance-voltage (CV and GV) analysis of AlN/SiC MIS capacitors. The crystalline AlN layers are made by hot wall MOCVD. CV analysis at room temperature reveals an order of magnitude lower density of interface traps at the AlN/SiC interface than at nitrided SiO2/SiC interfaces. Electron trapping in bulk traps within the AlN is significant when the MIS capacitors are biased into accumulation resulting in a large flatband voltage shift towards higher gate voltage. This process is reversible and the electrons are fully released from the AlN layer if depletion bias is applied at elevated temperatures. Current-voltage (IV) analysis reveals that the breakdown electric field intensity across the AlN dielectric is 3–4 MV/cm and is limited by trap assisted leakage. By depositing an additional SiO2 layer on top of the AlN layer, it is possible to increase the breakdown voltage of the MIS capacitors significantly without having much impact on the quality of the AlN/SiC interface.

    关键词： AlN/4H-SiC interface,MIS capacitors,Gate dielectrics

    更新于2025-09-23 15:22:29