A resist-less patterning method of Al thin film on polycarbonate by F2 laser irradiation

摘要： In recent years, polycarbonate is gathering interests as light and strong material for smart windows. In this paper, a resist-less patterning method of Al thin ?lm on silicone hard-coated polycarbonate by 157 nm F2 laser irradiation is reported. A photomask placed on Al thin ?lm on polycarbonate and irradiated with F2 laser and the non-irradiated area was removed by KOH aq. The mechanism of the method was examined by XPS measurement and it represents that the surface of Al thin ?lm is modi?ed to Al2O3 by F2 laser irradiation and the Al2O3 surface prevents the chemical etching. The ATR-FTIR and XPS measurements of polycarbonate surface under Al thin ?lm imply that the silicone hard coat layer of polycarbonate was oxidized by F2 laser irradiation even under Al thin ?lm and Al-O-Si bonds might be formed between Al and silicone hard coat interface. The formation of Al2O3 at the surface of Al thin ?lm and Al-O-Si bonds at Al/silicone hard coat interface are expected to give abrasion resistance and strong adhesion for Al thin ?lm on silicone hard-coated polycarbonate. This patterned Al ?lm fabrication method contributes to the manufacturing of electrodes for smart polycarbonate windows.