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22.3: Low cost fabrication of high contrast ratio and high transmission wire grid polarizer by nanoimprint lithography
摘要： This paper proposes a novel approach for low cost fabrication of large area wire grid polarizer (WGP). WGPs regarded as one potential alternative to traditional rear polarizer and DBEF possess the advantages of large contrast ratio (CR), high transmission. To date WGPs can be fabricated through electron beam direct write, which is slow and expensive, therefore not suitable for large area application. With the development of nano-fabrication methods, for instance, nanoimprint lithography (NIL), large area WGP can be made at low cost and fast speed. Furthermore, flexible polarizer can also be made through roll-to-roll (R2R) NIL. In this paper, a WGP with high TM transmission of around 85% and low TE transmission down to 0.2% through the visible light spectra will be realized through nanofabrication. The contrast ratio of the WGP can reach >450 with peak value >3000. For the fabrication process, atom layer deposition (ALD) will be utilized to prepare imprint mask which can achieve highly precise control of expected structure. In this paper, characterization of the designed WGP will also be narrated in the back part, including transmission, CR and the SEM schematic diagram. We believe that low cost fabrication method shows the potential to be adopted for industrial fabrication of polarizer in the future.
关键词： atom layer deposition (ALD),large area fabrication,low cost fabrication,wire grid polarizer (WGP),high contrast ratio,nanoimprint lithography (NIL),high TM transmission
更新于2025-09-23 15:22:29
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A Method for Estimating the Filling Rate of the Mold Cavity in Nanoimprint Lithography
摘要： When the dimensions of a microelectronic structure decrease, high manufacturing costs are inevitable. A low cost and high throughput manufacturing technique for nanostructures is desired. Nanoimprint lithography involves patterning the resist through physical deformation by using a mold at nanoscale and has the potential to meet these expectations. Therefore, nanoimprint lithography has been extensively studied in recent years. Many real time measurements have been proposed for enhancing the yield of nanoimprint lithography. Among these measurements, the application of surface plasmon resonance has the advantage of quick, highly accurate analysis. In surface plasmon resonance application, the mold contains a gold ?lm for exciting surface plasmon resonance and an adhesion layer is applied to both sides of the gold ?lm to increase the lifespan of the mold. However, the effect of the geometric characteristics of the adhesive layer on the surface plasmon resonance spectrum and the mechanical strength of the mold has not been extensively studied. To improve the detection accuracy and reliability of the measurement, this study investigated the aforementioned effect. Analytical and experimental investigations con?rmed that the shape of the spectrum is in?uenced by the surface roughness and thickness of the titanium adhesion layer. To maintain the sharpness of the resonance dip, we suggest reducing the thickness of the titanium adhesion layer to below 6 nm and maintaining the surface roughness below 3 nm. Moreover, the proposed mold structure conforms to these requirements and is applied to estimate the ?lling rate. The measurement results demonstrate that the surface plasmon resonance spectrum is clearly affected by the mold ?lling. Speci?cally, the change in the surface plasmon resonance spectrum curve and resonance angle can indicate the quality of the imprinted pattern. This study demonstrates the effectiveness and high sensitivity of the proposed technique for estimating the ?lling rate of the mold cavity in nanoimprint lithography.
关键词： Nanoimprint Lithography (NIL),Surface Roughness,Filling Rate,Surface Plasmon Resonance (SPR),Non-Destructive Measurement
更新于2025-09-10 09:29:36