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Role of ion energy flux on the structural and morphological properties of silicon oxy-nitride composite films deposited by plasma focus device
摘要： Crystalline silicon oxy-nitride (SiON) composite films are deposited on Si substrate for multiple (5, 15, 25 and 50) focus shots (FS) by plasma focus device. The X-rays diffraction patterns reveal the development of various diffraction peaks related to Si, Si3N4, and SiO2 phases which confirms the formation of SiON composite film. The intensity of Si3N4 (1 0 2) plane is linearly increased with the increase of FS. The Si3N4 (1 0 2) phase does not nucleate for 5 FS. Raman analysis confirms the formation of β–Si–N phase. Raman and Fourier transform infrared spectroscopy analysis reveals that the strength of chemical bonds like Si–N, Si–O formed during the deposition process of SiON composite films is associated with the bonds intensity which in turn depends on the number of FS. The field emission scanning electron microscopic analysis reveals that the surface morphology like size, shape and distribution of micro/nano-dimensional particles, film compactness and the formation of micro-rods, micro-teethes and micro-tubes of SiON composite films is entirely associated with the rise in substrate surface transient temperature which in turn depends on the increasing number of FS. The EDX spectrum confirms the presence of Si (22.5 ± 4.7 at. %), N (13.4 ± 4.5 at. %) and O (54.7 ± 11.3 at. %) in the SiON composite film. The thickness of SiON composite film deposited for 50 FS is found to ～ 15.47 μm.
关键词： composite,crystallite size,micro-tubes,Plasma focus,thickness,XRD
更新于2025-09-23 15:21:21
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The Effect of the Shape of the Anode Head on the Nitrogen Soft X-Ray Emission from a Dense Plasma Focus Device: a Numerical Investigation Using the Modified Lee Model Code Accompanied by Experiments
摘要： An alternative way for calculating the magnetic ?eld in the Lee Model Code has been used. The effects of the various anode-tip shapes on the DPF behavior have been studied. The current and impedance calculations have been employed for these investigations. For the conical anode tip, the best pinch current and soft x-ray radiation have been seen in simulations which was in good agreement with the empirical results. The investigations were carried out for the voltages of 11, 12, and 13 kV and the pressure range of 1–6 Torrs. The asymmetry in the discharging current has been investigated through three arbitrarily de?ned cathode current distribution patterns. The simulations showed that asymmetry in the axial discharge current increased the plasma Impedance and consequently reduced the soft x-ray emission.
关键词： Plasma inductance,Dense plasma focus (DPF),Current asymmetry,Anode shape,Lee model code
更新于2025-09-10 09:29:36