In-Situ Plasma Monitoring during the Pulsed Laser Deposition of Ni60Ti40 Thin Films

摘要： The properties of pulsed laser deposited of Ni60Ti40 shape memory thin films generated in various deposition conditions were investigated. In-situ plasma monitoring was implemented by means of space- and time-resolved optical emission spectroscopy, and ICCD fast camera imaging. Structural and chemical analyses were performed on the thin films using SEM, AFM, EDS, and XRD equipment. The deposition parameters influence on the chemical composition of the thin films was investigated. The peeled layer presented on DSC a solid-state transformation in a different transformation domain compared to the target properties. A fractal model was used to describe the dynamics of laser produced plasma through various non-differentiable functionalities. Through hydrodynamic type regimes, space-time homographic transformations were correlated with the global dynamics of the ablation plasmas. Spatial simultaneity of homographic transformation through a special SL(2R) invariance implies the description of plasma dynamics through Riccati type equations, establishing correlations with the optical emission spectroscopy measurements.