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[IEEE 2019 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC) - Munich, Germany (2019.6.23-2019.6.27)] 2019 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC) - Permanent Optimization of Large-FSR Dual-Microring Bandpass Filters
摘要： Energy-ef?cient communication links are crucial for future processors and optoelectronic microchips in order to continue growths in computing and information technologies [1]. Wavelength-division multiplexing (WDM) techniques based on silicon photonic circuits are ideal for high bandwidths data communication systems with small footprints [2,3]. Compact double ring resonators (DRRs) provide excellent properties to realize spectral ?lters with ?at-top transmission characteristics, providing a steep roll-off with low channel crosstalk at dense frequency grids. Hence, cascaded DRRs as illustrated in Fig. 1 (a) are well-suited for integrated WDM systems on optoelectronic microchips. The high refractive index of silicon facilitates small ring perimeters and the wide free spectral range (FSR ∝ 1 Lr ) enables multiplexing tens of data channels to a common bus waveguide. The high energy-ef?ciency which is enhanced by the strong thermo-optic effect (TOE) combined with the short physical lengths is another relevant advantage of the compact size. However, manufacturing variability and associated photonic component deviations remain a serious drawback [4]. Hence, most recent works use thermal heaters for the dynamic ?lter control as well as to counterbalance inevitable manufacturing deviations [5-7]. In this work, we present multilayer compatible 5 and 10μm radius DRR ?lters based on microrings manufactured with deposited amorphous silicon [8]. We demonstrate a permanent correction of manufacturing variations and optimize the spectral properties of DRR ?lters. Such fabrication imperfections which may arise more frequently in multilayer circuits are exempli?ed in Fig. 1 (a) where widths (Δw), heights (Δh), and refractive index (Δn) variations are implemented to one microring; even lowest deviations substantially degrade the ?lter response. A DRR measurement with undesired drop port splitting which was corrected through the SiO2 top cladding by 405 nm laser-trimming one of the rings is shown in Fig. 1 (b); the intermediate trimming spectra are provided in order to guide the eye. The possibility to permanently align ?lters to a given wavelength channel is presented in Fig. 1 (c). In this experiment both 5 μm radius racetracks were alternately trimmed to shorter wavelengths, without degrading the spectrum or the ?lter bandwidths. In summary, several compact DRR ?lters with multiplexers up to 8-channels suitable for multilayer integration at the CMOS back-end-of-line with start-of-art performance were successfully fabricated and tested. Malfunctioning components were identi?ed and optimized on micron-scales by a post-fabrication trimming method. The proposed correction method for DRR multiplexers allows adjusting ?lters to a prespeci?ed wavelength channel and enables more generalized concepts which do not require a thermal heater for each ring thereby mitigating detrimental thermal crosstalk and lowering the overall energy consumption.
关键词： manufacturing variability,Wavelength-division multiplexing (WDM),spectral ?lters,double ring resonators (DRRs),silicon photonic circuits,thermal heaters,Energy-ef?cient communication links,laser-trimming,amorphous silicon,CMOS back-end-of-line
更新于2025-09-16 10:30:52
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[ASME ASME 2018 International Design Engineering Technical Conferences and Computers and Information in Engineering Conference - Quebec City, Quebec, Canada (Sunday 26 August 2018)] Volume 2A: 44th Design Automation Conference - Design Exploration of Reliably Manufacturable Materials and Structures With Applications to a Microstereolithography System
摘要： One of the challenges in designing for additive manufacturing (AM) is accounting for the differences between as-designed and as-built geometries and material properties. From a designer’s perspective, these differences can lead to degradation of part performance, which is especially difficult to accommodate in small-lot or one-of-a-kind production. In this context, each part is unique, and therefore, extensive iteration is costly. Designers need a means of exploring the design space while simultaneously considering the reliability of additively manufacturing particular candidate designs. In this work, a design exploration approach, based on Bayesian network classifiers (BNC), is extended to incorporate manufacturability explicitly into the design exploration process. The example application is the design of negative stiffness (NS) metamaterials, in which small volume fractions of negative stiffness (NS) inclusions are embedded within a host material. The resulting metamaterial or composite exhibits macroscopic mechanical stiffness and loss properties that exceed those of the base matrix material. The inclusions are fabricated with microstereolithography with features on the scale of tens of microns, but variability is observed in material properties and dimensions from specimen to specimen. In this work, the manufacturing variability of critical features of a NS inclusion fabricated via microstereolithography are characterized experimentally and modelled mathematically. Specifically, the variation in the geometry of the NS inclusions and the Young’s modulus of the photopolymer are measured and modeled by both nonparametric and parametric joint probability distributions. Finally, the quantified manufacturing variability is incorporated into the BNC approach as a manufacturability classifier to identify candidate designs that achieve performance targets reliably, even when manufacturing variability is taken into account.
关键词： negative stiffness metamaterials,Bayesian network classifiers,additive manufacturing,microstereolithography,manufacturing variability
更新于2025-09-09 09:28:46