- 标题
- 摘要
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- 实验方案
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[IEEE 2018 International Semiconductor Conference (CAS) - Sinaia, Romania (2018.10.10-2018.10.12)] 2018 International Semiconductor Conference (CAS) - Direct Writing Patterns for Gold Thin Film with DPN Technique
摘要： Dip-pen nanolithography combined with wet-chemical etching has been used to generate gold nanostructures with desired shapes and sizes. Self-assembled monolayers of 16-mercaptohexadecanoic acid have been patterned by DPN in different shapes: dots, lines and complex shapes, interdigits electrodes. AFM and LFM were used to measure the roughness of gold surface and to examine the thiol deposition and binding quality. These results show that DPN can be used as alternative method to generate different patterns used for complex devices, biosensor, and optoelectronic devices.
关键词： wet chemical etching,dip pen nanolithography,MHA,direct-write
更新于2025-09-23 15:22:29
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Photoinitiator Free Resins Composed of Plant-Derived Monomers for the Optical μ-3D Printing of Thermosets
摘要： In this study, acrylated epoxidized soybean oil (AESO) and mixtures of AESO and vanillin dimethacrylate (VDM) or vanillin diacrylate (VDA) were investigated as photosensitive resins for optical 3D printing without any photoinitiator and solvent. The study of photocross-linking kinetics by real-time photorheometry revealed the higher rate of photocross-linking of pure AESO than that of AESO with VDM or VDA. Through the higher yield of the insoluble fraction, better thermal and mechanical properties were obtained for the pure AESO polymer. Here, for the first time, we validate that pure AESO and mixtures of AESO and VDM can be used for 3D microstructuring by employing direct laser writing lithography technique. The smallest achieved spatial features are 1 μm with a throughput in 6900 voxels per second is obtained. The plant-derived resins were laser polymerized using ultrashort pulses by multiphoton absorption and avalanche induced cross-linking without the usage of any photoinitiator. This advances the light-based additive manufacturing towards the 3D processing of pure cross-linkable renewable materials.
关键词： polymerization (2PP),vanillin dimethacrylate,photocross-linking,direct laser writing,acrylated epoxidized soybean oil,two-photon,optical 3D printing,nanolithography,multi-photon processing,vanillin diacrylate
更新于2025-09-23 15:22:29
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Mechanically Induced Switching of Molecular Layers
摘要： Within the field of switchable surfaces, azobenzenes are an extensively studied group of molecules, known for reversibly changing conformation upon illumination with light of different wavelengths. Relying on the ability of the molecules to change properties and structure as a response to external stimuli, they have been incorporated in various devices, such as molecular switches and motors. In contrast to the well-documented switching by light irradiation, we report the discovery of mechanically triggered switching of self-assembled azobenzene monolayers, resulting in changes of surface wettability, adhesion, and friction. This mechanically induced cis?trans isomerization is triggered either locally and selectively by AFM or macroscopically by particle impact. The process is optically reversible, enabling consecutive switching cycles. Collective switching behavior was also observed, propagating from the original point of impact in a domino-like manner. Finally, local force application facilitated nondestructive and erasable nanopatterning, the cis?trans nanolithography.
关键词： Molecular switch,self-assembled monolayers,mechanical switching,nanolithography,azobenzene
更新于2025-09-19 17:15:36
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[IEEE 2019 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC) - Munich, Germany (2019.6.23-2019.6.27)] 2019 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC) - Stitchless Support-Free Fabrication of Free-Form Micromechanical Structures using Femtosecond Laser 3D Lithography
摘要： Femtosecond laser based 3D nanolithography is gaining popularity in huge variety of fields. However, further improvements are needed to push it from laboratory level use into a wide spread adaptation. These include increasing fabrication throughput without sacrificing quality of a final product and making the most challenging, free-movable 3D structures easy to print. In this work we present several advances needed to achieve these goals. First, linear stage and galvo-scanners synchronization is employed to produce stitch-free mm-sized structures with features down to micrometers. Furthermore, resolution bridge method is used to determine feature sizes acquired by varying objective numerical apertures (NA) from 0.8 NA to 1.4 NA. This way voxel size can be tuned in the range from 330 nm to 1.7 μm in transverse and 1.9 μm to 7.9 μm in longitudinal directions. At 1 cm/s translation velocity it results in voxel volumes from 0.017 μm3 to 3.759 μm3 with structuring rates at 2426 μm3/s and 104767 μm3/s respectively. This two orders of magnitude tunability is exploited to fabricate various functional structures. For instance, deformable microcantilevers and microsprings capable of sustaining multiple deformation cycles were created using 0.8 NA objective chosen for faster printing with acceptable resolution. Performance and longevity of these elements were characterized in both qualitative and quantitative manner. Furthermore, the hard gel form of the SZ2080 photopolymer used in this work allowed to perform support-free structuring of free-movable micromechanical components employing high-resolution structuring achievable with 1.4 NA objective. Possibility to forgo usage of supports needed with liquid resins eliminates the need to remove supports after printing making the whole process simpler. To demonstrate the potency of this approach movable mm-sized micromechanical spider and squid were fabricated, showing possibility to print true 3D hinge-like microstructures (feature size down to micrometers). Such structures have huge potential in the fields of sensors and microrobotics as mechanically induced deformation of movement can be employed as either means to detect outside force or provide a basis for self-propelling functional structures.
关键词： micromechanical structures,free-movable 3D structures,support-free structuring,Femtosecond laser,3D nanolithography
更新于2025-09-12 10:27:22
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Characterization of radiative and kinetic properties of laser produced plasmas for efficient extreme ultraviolet nanolithography sources
摘要： Increasing extreme ultraviolet (EUV) photon power in laser-produced plasma (LPP) sources is critically important for e?cient future nanolithography devices. Enhancing the lifetime of the optical collector system in these devices is another important challenge for reliable and economically feasible devices. In this work, various mechanisms a?ecting ion acceleration in LPP were investigated to predict the maximum ion energies and ?ux arriving at the collecting mirror surfaces. Plasma evolution produced by an Nd:YAG laser from Sn targets was studied in detail to predict the dynamics of EUV producing ions and their contribution to the EUV power. The multiphysics fully 3D integrated HEIGHTS computer package was used in this analysis. HEIGHTS simulations of detail plasma evolution and ion kinetic energies were compared with various worldwide experimental data. Excellent agreement was shown regarding the range of ion kinetic energies and their angular distribution as well as recombination processes and their e?ect on the temporal output of EUV photons. Spatial and charge distributions were predicted for EUV producing ions and ionic debris. The analysis showed that mainly two Sn ions, i.e., Sn XII and Sn XIII, determine the EUV source intensity and spatial location. It was also shown that reducing the laser spot size and increasing the pulse duration allow a signi?cant reduction in ion kinetic energies that is important for a longer lifetime of the optical collection system.
关键词： laser-produced plasma,ion acceleration,extreme ultraviolet,nanolithography,EUV photon power
更新于2025-09-12 10:27:22
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ions
摘要： Laser-produced Sn plasma sources are used to generate extreme ultraviolet light in state-of-the-art nanolithography. An ultraviolet and optical spectrum is measured from a droplet-based laser-produced Sn plasma, with a spectrograph covering the range 200–800 nm. This spectrum contains hundreds of spectral lines from lowly charged tin ions Sn1+?Sn4+ of which a major fraction was hitherto unidenti?ed. We present and identify a selected class of lines belonging to the quasi-one-electron, Ag-like ([Kr]4d 10 nl electronic con?guration), Sn3+ ion, linking the optical lines to a speci?c charge state by means of a masking technique. These line identi?cations are made with iterative guidance from COWAN code calculations. Of the 53 lines attributed to Sn3+, some 20 were identi?ed from previously known energy levels, and 33 lines are used to determine previously unknown level energies of 13 electronic con?gurations, i.e., 7p, (7, 8)d, (5, 6)f , (6–8)g, (6–8)h, (7, 8)i. The consistency of the level energy determination is veri?ed by the quantum-defect scaling procedure. The ionization limit of Sn3+ is con?rmed and re?ned to 328 908.4 cm?1, with an uncertainty of 2.1 cm?1. The relativistic Fock-space coupled-cluster (FSCC) calculations of the measured level energies are generally in good agreement with experiment but fail to reproduce the anomalous behavior of the 5d 2D and nf 2F terms. By combining the strengths of the FSCC calculations, COWAN code calculations, and con?guration interaction many-body perturbation theory, this behavior is shown to arise from interactions with doubly excited con?gurations.
关键词： Sn3+ ions,energy-level structure,nanolithography,laser-produced plasma,extreme ultraviolet light
更新于2025-09-09 09:28:46
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Nano- and Microfabrication for Industrial and Biomedical Applications || Basic technologies for microsystems
摘要： This chapter introduces the reader the processes used to manufacture microelectronics. A silicon wafer is coated with a resist, most usually by wet deposition. Vapor deposition is also used, but high vacuum conditions are needed. The resist is a photosensitive polymer, which either cross-links or is destroyed under ultra violet (UV) light. Photolithography illuminates this resist through a pattern. The pattern is designed by computer-aided design (CAD), and copied onto a mask of borosilicate. Silicon is machined by wet chemical etching (which has precision limitations, but relatively low cost), or dry etching processes, in which its surface is bombarded with ions. Alternatively, the Bosch process uses gasses heated under low pressure to a plasma state to etch the surface. A great deal of research is under way to investigate other techniques and materials for use in microsystems. Examples include the use of powder blasting and laser ablation as etching techniques, and single-crystal (SC) quartz, amorphous glass, and thermoplastic polymers as alternatives to silicon. Thick resist lithography and locally controlled photopolymerization are techniques that could be used to create microscale features in these polymers. Since recent developments in industrial, biological, and biomedical applications particularly embrace replication technology as a means to pattern multiple parts from a master pattern or even use it for stamping biomolecular features onto a surface for the design and development of novel biological assays, it is time to introduce soft-lithography among the basic microsystems technologies together with a set of nanolithographies presented in Chapter 4.
关键词： soft-lithography,silicon micromachining,thin films,microsystems,nanolithography,photolithography
更新于2025-09-09 09:28:46
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Additive-Manufacturing of 3D Glass-Ceramics down to Nanoscale Resolution
摘要： Fabrication of a true-3D inorganic ceramic with resolution down to nanoscale (～ 100 nm) using sol-gel resist precursor is demonstrated. The method has an unrestricted free-form capability, control of the ?ll-factor, and high fabrication throughput. A systematic study of the proposed approach based on ultrafast laser 3D lithography of organic-inorganic hybrid sol-gel resin followed by a heat treatment enabled formation of inorganic amorphous and crystalline composites guided by the composition of the initial resin. The achieved resolution of 100 nm was obtained for 3D patterns of complex free-form architectures. Fabrication throughput of 50 × 103 voxels/s is achieved; voxel - a single volume element recorded by a single pulse exposure. A post-exposure thermal treatment was used to form a ceramic phase which composition and structure were dependent on the temperature and duration of the heat treatment as revealed by Raman micro-spectroscopy. The X-ray diffraction (XRD) showed a gradual emergence of the crystalline phases at higher temperatures with a signature of cristobalite SiO2, a high-temperature polymorph. Also, a tetragonal ZrO2 phase known for its high fracture strength was observed. This 3D nano-sintering technique is scalable from nanoscale to millimeter dimensions and opens a conceptually novel route for optical 3D nano-printing of various crystalline inorganic materials de?ned by an initial composition for diverse applications for microdevices designed to function in harsh physical and chemical environments and at high temperatures.
关键词： ultrafast 3D laser nanolithography,3D nanoscale optical printing,inorganic 3D structures,high-temperature glass-ceramic materials,calcination
更新于2025-09-04 15:30:14