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oe1(光电查) - 科学论文

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  • Subwavelength-scale nanorods implemented hexagonal pyramids structure as efficient light-extraction in Light-emitting diodes

    摘要： Subwavelength-scale nanorods were implemented on the hexagonal pyramid of photochemically etched light-emitting diodes (LEDs) to improve light extraction efficiency (LEE). Sequential processes of Ag deposition and inductively coupled plasma etching successfully produce nanorods on both locally unetched flat surface and sidewall of hexagonal pyramids. The subwavelength-scale structures on flat surface offer gradually changed refractive index, and the structures on side wall of hexagonal pyramid reduce backward reflection, thereby enhancing further enhancement of the light extraction efficiency. Consequently, the nanorods implemented LED shows a remarkable enhancement in the light output power by 14% compared with that of the photochemically etched LEDs which is known to exhibit the highest light output power. Theoretical calculations using a rigorous coupled wave analysis method reveal that the subwavelength-scale nanorods are very effective in the elimination of TIR as well as backward reflections, thereby further enhancing LEE of the LEDs.

    关键词： subwavelength-scale nanorods,light-emitting diodes,light extraction efficiency,hexagonal pyramids,photochemical etching

    更新于2025-09-23 15:21:01

  • Surface smoothing of poly(methyl methacrylate) film by laser induced photochemical etching

    摘要： The surface of poly(methyl methacrylate) (PMMA) ?lm was etched by laser irradiation under O2 and vacuum conditions. By activating the O2 molecules near the rough surface, oxygen radicals will preferably etch the protrusions on the PMMA surface. Three lasers of different wavelengths were used for comparison. Laser irradiation at a short wavelength such as 325 nm resulted in high etch rates whereas a long wavelength such as 532 nm resulted in no effect on the surface pro?le. The PMMA surface was not etched under the vacuum condition, indicating the necessity of O2 molecules in etching.

    关键词： surface smoothing,wavelength dependence,oxygen radicals,poly(methyl methacrylate),laser induced photochemical etching

    更新于2025-09-16 10:30:52