Materials Overview for 2-Photon 3D Printing Applications

摘要： Interest in microscale 3D lithography continues to grow with the development of new tools and new patterning materials. To date most available materials are rigid, glassy systems derived from stereolithography studies. Soft materials lack the same level of sophistication, but there is a drive to improve this situation with the introduction of new elastomers and hydrogels. A general strategy is lacking for these 3D patterning systems as there is for the production of chemically amplified photoresists. This paper describes both positive and negative tone chemically amplified 3D materials as well and photocured systems based on radical and cationic crosslinking systems.