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oe1(光电查) - 科学论文

12 条数据
?? 中文(中国)
  • [IEEE 2018 20th International Conference on Transparent Optical Networks (ICTON) - Bucharest (2018.7.1-2018.7.5)] 2018 20th International Conference on Transparent Optical Networks (ICTON) - Nonlinear Optical Properties of Oxide Thin Films

    摘要: This work contains description of the oxide thin films fabricated by Physical Vapor Deposition technique in high vacuum on transparent (quartz) and semiconductor (n-type silicon) substrates kept at room temperature during the deposition process. Titanium, tin and indium oxides were chosen as the material for investigation. Selected films were annealed after fabrication in ambient atmosphere for 12 hours at the temperature equal to 100 °C, 150 °C, 250 °C and 450 °C. Structural properties were examined by optical images and AFM measurements. The films exhibit high structural dependence on the temperature of the annealing process. Quality of the films can be improved by using an appropriate temperature during the annealing process. Nonlinear optical effects were studied using Third Harmonic Generation with Nd:YAG laser at 1064 nm wavelength as a fundamental beam. The values of third-order NLO susceptibilities were calculated and analyzed. We find that the nonlinear optical properties were strictly connected with the morphology. Moreover the temperature of annealing process can change the structural and optical properties of the tested oxide thin films.

    关键词: third harmonic generation,atomic force microscopy,oxide thin films,physical vapor deposition

    更新于2025-09-09 09:28:46

  • Tuning the Crystalline Structure and Properties of TiO <i> <sub/>x</sub></i> Thin Films Deposited by DC Reactive Magnetron Sputtering by Adjusting the Ar/O <sub/>2</sub> Ratio

    摘要: In this study, TiOx thin films were deposited by DC reactive magnetron sputtering (DC-RMS), using different Ar/O2 ratios in the absence of substrate bias and substrate heating. We observe a gradual change in the crystal structure and stoichiometry of the films with increasing Ar/O2 ratio, enabling to obtain TiOx films either with a pure anatase phase, a mixture between anatase and rutile, or a pure rutile phase. Our experimental results demonstrate that, by fine tuning the Ar/O2 ratio during DC-RMS deposition process, a TiOx thin film with tunable crystal structure and properties (surface morphology, atomic density, index of refraction, and film hardness) can be obtained in a simple way.

    关键词: Sputtering,Physical Vapor Deposition,Thin Film,TiO2,Crystal Structure

    更新于2025-09-04 15:30:14