- 标题
- 摘要
- 关键词
- 实验方案
- 产品
-
[IEEE 2018 20th International Symposium on High-Current Electronics (ISHCE) - Tomsk, Russia (2018.9.16-2018.9.22)] 2018 20th International Symposium on High-Current Electronics (ISHCE) - Forevacuum Plasma Electron Source for Dielectric Surface Treatment
摘要： The paper presents a plasma electron source based on a hollow-cathode glow discharge for generating focused electron beams at forevacuum pressures (1–100 Pa). At an accelerating voltage of 20 kV and discharge current of 1.5 A, the source generates an electron beam of diameter ?10 mm with a current of 450 mA and maximum power of ?9 kW. The hollow cathode geometry of the source provides an electron extraction efficiency of 35 %, which is 10 % higher compared to the previous geometry (25 %). The attained beam parameters and the operation features of the forevacuum source allow its efficient use for high-temperature treatment of dielectric materials.
关键词： electron beams,emission efficiency,power density,emission,plasma sources,forevacuum
更新于2025-09-11 14:15:04
-
[IEEE 2018 28th International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV) - Greifswald, Germany (2018.9.23-2018.9.28)] 2018 28th International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV) - Vacuum-Arc Anode Phenomena: New Findings and New Applications
摘要： The vacuum arc modes from the viewpoint of anode activity have traditionally been considered as a diffuse arc, footpoints, anode spots, and an intense arc. Recent studies carried out jointly by the IHCE SB RAS and the INP-Greifswald have made it possible to identify anodic plume and anode spot type 2 as new modes of a high-current vacuum arc, specific for electrodes made of a copper-chromium composition. The anode plume appears either immediately before the anode spot of type 2, or immediately after the extinction of the anode spot of type 2. The appearance of the plume before the spot is unstable, while after the spot the plume is stable. Appearance of the plume is an indicator of the intense vapor flux of the anode material, which can reduce the breaking capacity of the vacuum circuit breaker (VCB). Implementation of the VCB operating mode free of both the anode spot type 2 and anode plume allows a more successful recovering of the electric strength of the VCB after current zero.
关键词： vacuum arc,plasma diagnostics,plasma sources,circuit breakers
更新于2025-09-09 09:28:46
-
Numerical Identification of Trivelpiece–Gould Waves in an Electron Cyclotron Resonance Etching Reactor
摘要： Electron cyclotron resonance (ECR) plasma sources have been widely used for ultra-large-scale integration manufacturing processes because of their wide operating range and excellent uniformity over 300- or 450-mm diameter wafer. However, microwave electromagnetic fields in magnetized plasma-filled reactors are not well understood because of the complexity of electromagnetic wave field analysis. We conducted microwave electromagnetic field analysis of an ECR plasma etcher by the finite-element method using a simulation platform. Complicated electric field patterns were clearly observed under some conditions. We investigated the patterns in detail to determine whether they were spurious or not. The patterns proved to be Trivelpiece–Gould waves according to their characteristics imposed by the dispersion relation of waves. This analysis approach is a powerful method because very fine-wave structures can be identified.
关键词： Electron cyclotron resonance (ECR),plasma sources,etching,Trivelpiece–Gould (TG) waves
更新于2025-09-09 09:28:46
-
High-density cascade arc plasma sources for application to plasma windows for virtual vacuum interfaces
摘要： We develop two cascade arc plasma sources for application to plasma windows for virtual vacuum interfaces. For windowless vacuum–atmosphere separation, a compact arc discharge source having a channel diameter of 3 mm is fabricated, and an atmospheric Ar thermal plasma is generated. For an alternative differential pumping system, separating low- and high-pressure vacuum chambers, a larger arc device with an 8-mm diameter is also constructed, producing a high-density He plasma. The performances of the two cascade arcs as plasma windows are investigated. The 3-mm arc discharge generates a steep pressure gradient of Ar 100 kPa–100 Pa through the discharge channel, while the 8-mm discharge apparatus isolates the high-pressure side at 7 kPa from the lower pressure of 54 Pa. Emission spectroscopy of visible and vacuum UV radiation reveals the characteristics of the Ar and He plasmas. Spectral analysis yields a plasma temperature of around 1 eV in both discharges. Stark broadenings of the H-b and Ar I lines give an electron density of 6.5 (cid:2) 1016 cm(cid:3)3 for Ar 60 A with a gas ?ow rate of 1.0 l/min and 4.7 (cid:2) 1013 cm(cid:3)3 under a He 100-A and 0.45-l/min condition.
关键词： electron density,plasma temperature,emission spectroscopy,virtual vacuum interfaces,He plasma,cascade arc plasma sources,plasma windows,Ar thermal plasma
更新于2025-09-04 15:30:14