研究目的
研究具有选择性发射极和基于多晶硅钝化接触的高效n型硅PERT双面太阳能电池。
研究成果
该研究成功制备出大面积n型PERT双面晶体硅太阳能电池,其最高效率超过21%,采用前表面激光掺杂选择性发射极和背面基于多晶硅的钝化接触结构。理论模拟表明,通过优化SiOx层和界面参数,电池效率有望进一步提升至24.64%。
研究不足
该研究在常规大面积晶圆上形成并集成纳米级SiOx介电层面临挑战。氧化硅的质量会显著影响太阳能电池的电学性能。
1:实验设计与方法选择:
本研究制备了具有前表面选择性发射极和后表面基于多晶硅钝化接触的n型PERT双面晶体硅太阳能电池。采用激光掺杂法形成选择性发射极,利用硝酸氧化法生长纳米层SiOx。
2:样品选择与数据来源:
以商业级n型准方形(156×156 mm2)(100)晶向直拉法(Cz)晶体硅片作为起始材料。
3:实验设备与材料清单:
设备包括常规高温管式炉、纳秒脉冲激光器、PECVD和丝网印刷金属化设备;材料包含BBr?、硝酸及磷掺杂多晶硅。
4:实验流程与操作步骤:
工艺流程包含损伤蚀刻、碱制绒、BBr?扩散、激光掺杂选择性发射极、硝酸氧化、多晶硅PECVD沉积及丝网印刷金属化。
5:数据分析方法:
采用椭偏仪光谱分析、ECV剖面测试、EQE测量、QSSPC法及I-V测试进行表征。
独家科研数据包,助您复现前沿成果,加速创新突破
获取完整内容-
spectroscopic ellipsometry
400 adv-PV
Sentech
Used for extracting the thickness and refractive index of SiNx:H and SiOx layers.
-
high-temperature tube furnace
E2000 HT 300-5
Centrotherm
Used for BBr3 diffusion to form p+ emitter.
-
nanosecond pulse laser
TPC/TSC series
Tsemc
Used for local heavy doping to form p++ selective emitter.
-
PECVD
SINA XS
Roth & Rau
Used for depositing hydrogenated silicon nitride SiNx:H antireflective coatings.
-
screen-printed metallization
LTCC
Baccini
Used for front Ag/Al and rear Ag electrode grids.
-
infrared belt-furnace
CFD-9024
Dispatch
Used for co-firing screen-printed contacts.
-
electrochemical capacitance-voltage profiling
CVP21
WEP
Used for measuring the doping profiles in p++ SE and n+ poly-Si based passivating contacts.
-
4-point probes
280I Series
Four Dimensions Inc.
Used for determining the sheet resistance.
-
quantum efficiency measurement
QEX10
PV Measurements
Used for measuring the external quantum efficiency (EQE).
-
quasi-steady-state photo-conductance
WCT-120
Sinton Instruments
Used for obtaining the implied open-circuit voltage (implied-VOC) and effective minority carrier lifetime (τeff).
-
steady-state solar cell I-V tester
VS-6820
Industrial Vision Technology
Used for measuring the electrical properties (VOC, JSC, FF, and η) under standard test condition.
-
登录查看剩余9件设备及参数对照表
查看全部