The Nature of the Oxygen Vacancy in Amorphous Oxide Semiconductors: Shallow Versus Deep

摘要： Using first-principles calculation, we investigate the nature of oxygen vacancy (VO), namely shallow versus deep, in the amorphous oxide semiconductor InGaZnO4 (a-IGZO), which has not been fully clarified despite its technological importance. Oxygen-deficient amorphous models are generated through the hybrid functional molecular dynamics (MD) simulations that allow for finding stable VO configurations while minimizing computational approximations. From eight independent models, we consistently find that VO serves as the shallow donor, increasing the Fermi level above the conduction band minimum. For comparison purpose, we also generate deep VO models by charging the system during MD simulations. It is found that deep VO is higher in the formation energy than shallow VO, confirming that shallow VO is the preferred type of oxygen vacancies in a-IGZO.