- 标题
- 摘要
- 关键词
- 实验方案
- 产品
-
Flexibly adjustable depth-of-focus photoacoustic microscopy with spatial light modulation
摘要： Through focusing the excitation laser, optical-resolution photoacoustic microscopy (OR-PAM) is capable of measuring optical absorption properties down to micrometer-scale lateral resolution within biological tissues. The focused Gaussian beam routinely employed in the OR-PAM setups is inadequate for acquiring the volumetric images of biological specimens with thickness from tens micrometers to millimeter without scanning in depth because of the inconsistent lateral resolution along the depth direction due to its short depth of focus (DoF). Here, we integrate a spatial light modulator (SLM) into the optical path of an OR-PAM for realizing the flexibly adjustable DoF. By simply switching the phase patterns assigned onto the SLM interface, three representative illumination beams are produced, including conventional short-DoF Gaussian beam (GB), needle-like Bessel beam (BB), and extended depth-of-focus beam (EDFB). These modulations can be well realized based on the extended Nijboer-Zernike theory. The photoacoustic excitations show variable DoFs ranging from hundreds of micrometers (GB and BB) up to 1.38 mm (EDFB) but a consistent lateral resolution of (cid:2)3.5 lm. The proposed method is confirmed by volumetric imaging of multiple tungsten fibers positioned at different depths.
关键词： spatial light modulation,photoacoustic microscopy,depth-of-focus,extended depth-of-focus beam,Bessel beam,optical-resolution
更新于2025-09-23 15:21:21
-
PSS1 POOLED RESULTS OF THE TECNIS SYMFONY EXTENDED DEPTH OF FOCUS INTRAOCULAR LENS
摘要： Several prospective studies have indicated that the TECNIS Symfony, an extended depth of focus (EDOF) intraocular lens (IOL), achieves excellent visual outcomes at all distances after cataract surgery. The purpose of this study was to combine the visual outcomes from multiple recent studies of the TECNIS Symfony ZXR00. We performed a systematic literature review and subsequent data pooling of studies looking at corrected visual outcomes for patients within 6 months (range: 3-6 months) of receiving bilateral implantation of TECNIS Symfony IOLs following cataract surgery. The primary visual quality outcome of interest was accommodation measured by defocus curves. Data from monocular and binocular defocus curves were extracted and then pooled using a weighted average approach. Separate pooled curves were estimated for monocular and binocular data. We identified 25 articles of potential interest in the database review; 7 of these included TECNIS Symfony defocus curves. Of these, 3 provided monocular defocus curves (total eyes = 130), and 6 provided binocular defocus curves (total eyes = 310). The pooled defocus curves showed best corrected visual acuity generally remained high (LogMar # 0.2) from 1.0 diopters (D) to -2.0 D in patients who received TECNIS Symfony IOLs. For the pooled monocular defocus curve, the corrected distance visual acuity (0 D) was LogMar-0.04, the corrected intermediate visual acuity (66cm; -1.5 D) was LogMar0.13, and the corrected near visual acuity (40cm; -2.5 D) was LogMar0.40. For the pooled binocular defocus curve, the corrected distance visual acuity was LogMar-0.02, the corrected intermediate visual acuity was LogMar0.11, and the corrected near visual acuity was LogMar0.34. The TECNIS Symfony EDOF IOL provides successful visual restoration across all distances after cataract surgery, with a minimal level of disturbing photic phenomena and high levels of patient satisfaction.
关键词： intraocular lens,TECNIS Symfony,cataract surgery,visual outcomes,extended depth of focus
更新于2025-09-11 14:15:04
-
Reference Module in Materials Science and Materials Engineering || Optical Lithography
摘要： Optical lithography is a photon-based technique comprised of projecting, or shadow casting, an image into a photosensitive emulsion (photoresist) coated onto the substrate of choice. Today it is the most widely used lithography process in the manufacturing of nano-electronics by the semiconductor industry, a $400 Billion industry worldwide. Optical lithography’s ubiquitous use is a direct result of its highly parallel nature allowing vast amounts of information (i.e., patterns) to be transferred in a very short time. For example, considering the specification of a modern leading edge scanner (150–300-mm wafers per hour and 40-nm two-dimensional pattern resolution), the pixel throughput can be found to be approximately 1.8T pixels per second. Continual advances in optical lithography capabilities have enabled the computing revolution we have undergone over the past 50 years.
关键词： Nano-electronics,Numerical Aperture (NA),Coherence,Resolution,Photoresist,Depth of Focus (DOF),Optical Lithography,Extreme Ultraviolet (EUV),Semiconductor
更新于2025-09-10 09:29:36
-
Impact of higher-order aberrations on depth-of-field
摘要： It is well known that depth-of-focus (DOF) is influenced by optical factors (such as pupil size and monochromatic aberrations). However, neural factors such as blur sensitivity and defocus adaptation may play an important role on the extent of DOF. A series of experiments were conducted to study if optical or neural factors are most pertinent in explaining the variability of DOF across subjects. An adaptive optics system with a black and white target, a 3.8-mm artificial pupil, and a subjective criterion (based on objectionable blur) were used to measure depth of field ([DOFi]; DOF computed in the object space) in 11 participants, after at least 6 min of adaptation. This was done under three conditions: (a) with their own higher order aberrations (HOA); (b) after correction of their monochromatic HOA; and (c) after altering the HOA pattern for some participants to reflect the HOA pattern measured for a different participant. Natural DOFi and DOFi after HOA correction were positively correlated (R2 ? 0.461), but a significant decrease in DOFi (21% on average) was found after HOA correction (p ? 0.042). Effect of HOA on the intersubject variability of DOFi was 3.9 times smaller than the effect of the image neural processing. This study shows that DOFi depends on both optical and neural factors, but the latter seems to play a more important role than the former.
关键词： depth of focus,visual optics,wavefront aberrations,depth of field,physiological optics
更新于2025-09-09 09:28:46