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- 2019
- time delay
- fiber Bragg grating
- microwave photonics
- finite impulse response
- Fourier transform
- optical sensors
- Optoelectronic Information Science and Engineering
- Southern University of Science and Technology
- University of Kent
- University of Kent, Tianjin Normal University
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Energy-enhanced deposition of copper thin films by bipolar high power impulse magnetron sputtering
摘要： Bipolar Pulse High Power Impulse Magnetron Sputtering (BP-HiPIMS) was investigated and used in this work to control the ion bombardment process of growing thin films and to improve their structure and properties. Energy-resolving mass spectroscopy was used to investigate the effect of reverse target voltage on the ion energies and fluxes during BP-HiPIMS of a high-purity copper target, in argon gas. It was found that the reverse target voltage provides a wide range of ion energies and fluxes incident to the growing film, which, in turn, produce a wide variety of effects during the deposition process, improving the adhesion strength and influencing both surface and bulk properties. Fast ICCD imaging was used to investigate both HiPIMS and BP-HiPIMS plasma dynamics. The temporal and spatial distributions of plasma potential measurements were performed in order to explain the mechanisms for accelerating the ions. The topological, structural and mechanical properties of the deposited coatings were investigated using atomic force microscopy (AFM), X-ray diffraction (XRD), Rutherford backscattering spectrometry (RBS), thermal desorption spectroscopy (TDS), scanning electron microscopy (SEM), nanoindentation and scratch tests. The obtained results indicate an energy-enhanced deposition process during BP-HiPIMS, the deposited films being characterized by smooth surfaces, dense microstructure, small inert gas inclusions, high elastic strain to failure, scratch resistance and good adhesion to the substrate. These improvements in the films’ structure and properties may be attributed to the intense and energetic ion bombardment taking place during the deposition process. During BP-HiPIMS operation, there is no net increase in the deposition rate as compared to the monopolar regime due to the re-sputtering process.
关键词： Bipolar Pulse High Power Impulse Magnetron Sputtering (BP-HiPIMS),Tribology,Fast ICCD imaging,Ion energy distributions (IED)
更新于2025-09-04 15:30:14
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[IEEE 2018 IEEE 14th International Conference on Automation Science and Engineering (CASE) - Munich, Germany (2018.8.20-2018.8.24)] 2018 IEEE 14th International Conference on Automation Science and Engineering (CASE) - CKF-based Fast Error Compensation Filter Design for IR-UWB Indoor Positioning System for Building Automation
摘要： Recently, impulse radio-ultra wideband is widely used for highly accurate location estimation of robots and objects in indoor space for building automation. For their accurate positioning, calibration must be performed after the positioning system is installed, and a compensation technique of the multipath signals should be performed in real-time. In this paper, a real-time calibration and error compensation method is proposed. A filter that estimates channel common error and channel-specific error sequentially is designed based on cubature Kalman filter and the fast and accurate estimation performance of this filter is verified experimentally.
关键词： indoor positioning,impulse radio-ultra wideband,calibration,cubature Kalman filter,error compensation
更新于2025-09-04 15:30:14