Effect of two-step post-treatment on optical properties, microstructure, and nanosecond laser damage threshold of HfO <sub/>2</sub> /TiO <sub/>2</sub> /SiO <sub/>2</sub> multilayer high reflection films

摘要： HfO2/TiO2/SiO2 periodic multilayer high reflection films deposited by an electron beam are post-treated by two-step post-treatment and thermal annealing post-treatment, respectively. The optical properties, microstructures, surface morphologies, and laser-induced damage threshold (LIDT) of the films are studied comparatively. The results show that the two-step post-treatment enhances the high reflection films’ density and reduces the film surface roughness and the defects of the film. The test results show that the LIDT of HfO2/TiO2/SiO2 high reflection films treated by two-step post-treatment reaches 32.8 J/cm2, which is 110.26% higher than that of the untreated film. Compared with the HfO2/TiO2/SiO2 high reflection films after thermal annealing post-treatment, the LIDT increased nearly 27.6% after two-step post-treatment. Two-step post-treatment of high reflection films can effectively remove the defects on the surface of the film, reduce the oxygen vacancies inside the film, and further increase the laser damage threshold of the high reflection films.