研究目的
Optimization of ultrafast laser parameters for 3D micromachining of fused silica to achieve high surface quality, high volume production, and complex surfaces.
研究成果
The study successfully optimized ultrafast laser parameters for 3D micromachining of fused silica, achieving high surface quality and high manufacturing speed. The findings can guide practical fabrication trade-offs in optical components and applications.
研究不足
The study is limited to fused silica and specific laser parameters. The etching process is dependent on the chemical properties of the etchant and the laser-modified regions.
1：Experimental Design and Method Selection:
The study involved ultrafast laser direct writing assisted chemical etching on fused silica. Parameters such as laser pulse width, pulse energy, polarization, and number of overlapped pulses were varied to investigate their effects on nanogratings and selective etching.
2：Sample Selection and Data Sources:
1 mm thick Corning 7980 fused silica plates were used. The samples were diced and polished before etching.
3：List of Experimental Equipment and Materials:
The setup included Uranus (PolarOnyx) and Satsuma (Amplitude Systems) ytterbium-doped fiber lasers, Aerotech high precision positioning stages, Thorlabs 0.4NA, 20× micro focusing objective, and KOH solution for etching.
4：4NA, 20× micro focusing objective, and KOH solution for etching.
Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: Direct writing was performed beneath the top surface of the silica plate. The samples were then diced, polished, and etched in KOH solution. Surface quality was analyzed using scanning electron microscope (SEM) and white light interferometry.
5：Data Analysis Methods:
The effect of laser parameters on nanogratings and etching selectivity was analyzed. Surface roughness was measured using Gaussian filtering.
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