研究目的
Investigating the thermal stability improvement of metal oxide-based contacts for silicon heterojunction solar cells, specifically focusing on MoOx and TiOx as hole and electron selective contacts, respectively.
研究成果
The study demonstrated that pre-annealing the i-a-Si:H layer before TiOx deposition significantly improves the thermal stability of the ATOM contact, leading to higher efficiency in doping-free silicon solar cells. The insights gained could be applied to develop other stable metal-oxide based electron or hole contacts.
研究不足
The study highlights the technical constraints related to the thermal stability of metal oxide-based contacts and suggests potential areas for optimization, such as the thickness of the low-work function metal and the annealing conditions.
1:Experimental Design and Method Selection:
The study involved the fabrication of doping-free silicon solar cells using MoOx and TiOx as carrier-selective contacts. The thermal stability of these contacts was investigated through pre- and post-annealing treatments.
2:Sample Selection and Data Sources:
Double-side textured n-type Cz-Si wafers were used for the experiments. The hydrogen content in i-a-Si:H was measured using elastic recoil detection (ERD).
3:List of Experimental Equipment and Materials:
Equipment included PECVD for i-a-Si:H deposition, ALD for TiOx deposition, and RTA for annealing. Materials included MoOx, TiOx, Yb, and Ag.
4:Experimental Procedures and Operational Workflow:
The process involved cleaning the wafers, depositing i-a-Si:H and TiOx layers, annealing treatments, and depositing metal contacts. The thermal stability was evaluated through post-fabrication annealing and damp-heat tests.
5:Data Analysis Methods:
The contact resistivity (ρc) was measured to evaluate the thermal stability of the contacts. The efficiency of the solar cells was measured under standard conditions.
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