研究目的
Investigating the structural changes in SiO2 glass under extreme compression up to 160 GPa to understand the densification mechanisms of amorphous oxides.
研究成果
The study reveals the formation of oxygen quadclusters in SiO2 glass under extreme compression, providing insights into the densification mechanisms of amorphous oxides. The linear relationship between the oxygen partial density of states and the bulk density establishes a predictive model for oxide densification above megabar pressures.
研究不足
The inherent inefficiency of the XRS process limits the maximum pressure conditions for the collection of inelastic scattering x rays. The pressure variation within the sample chamber at high-pressure conditions is up to ~10 GPa.
1：Experimental Design and Method Selection:
X-ray Raman scattering (XRS) was used to study the local electronic bonding environments around oxygen in SiO2 glass under compression.
2：Sample Selection and Data Sources:
SiO2 glass (Corning FS7980) was loaded into a panoramic diamond anvil cell using a beryllium gasket.
3：List of Experimental Equipment and Materials:
Diamond anvil cell, beryllium gasket, HPCAT beam line 16-ID-D at the Advanced Photon Source, polycapillary postcollimation optics, single spherical Si(555) analyzer, Amptek silicon detector.
4：Experimental Procedures and Operational Workflow:
The XRS spectra were collected by scanning the incident photon energy relative to the analyzer energy of
5：908 keV. The pressure was estimated using the Raman signal from the diamond culet. Data Analysis Methods:
The edge energies at the centers of gravity of the XRS features were analyzed to infer the densification of silicate melts.
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