1：Experimental Design and Method Selection:

The study involved the use of PEIE to functionalize the surface of C60 for the subsequent deposition of ALD SnO2. The methodology included AES mapping, AFM measurements, and XPS depth profiling to evaluate the nucleation and barrier properties of the ALD films.

2：The methodology included AES mapping, AFM measurements, and XPS depth profiling to evaluate the nucleation and barrier properties of the ALD films. Sample Selection and Data Sources:

2. Sample Selection and Data Sources: Samples included Cs0.25FA0.75Pb(Br0.20I0.80)3 films on glass substrates with and without PEIE nucleation layers. Data were collected from AES, AFM, and XPS measurements.

3：25FA75Pb(Br20I80)3 films on glass substrates with and without PEIE nucleation layers. Data were collected from AES, AFM, and XPS measurements. List of Experimental Equipment and Materials:

3. List of Experimental Equipment and Materials: Equipment included a PHI 700 Scanning Auger Nanoprobe for AES, a Jasco Model V-670 UV-Vis-NIR spectrometer for absorption measurements, and a PHI VersaProbe 3 system for XPS. Materials included PEIE, C60, and ALD precursors for SnO2 and VOx.

4：Experimental Procedures and Operational Workflow:

The procedure involved depositing PEIE on C60, followed by ALD of SnO2 or VOx. The samples were then subjected to stress tests including high-temperature annealing and water exposure to evaluate barrier properties.

5：Data Analysis Methods:

Data analysis involved comparing the nucleation and growth of ALD films on different surfaces using AES, evaluating film continuity and barrier properties through AFM and XPS, and assessing device performance and stability under operational conditions.