研究目的
To introduce a simple yet versatile method to fabricate multiple nanopatterns on flexible substrate coated with azopolymer by combining athermal nanoimprint lithography (AT-NIL) and photolithography, addressing the limitations of traditional thermal nanoimprint lithography (T-NIL) and ultraviolet-curable nanoimprint lithography (UV-NIL) in generating multiple and rewritable nanopatterns.
研究成果
The study presents a facile fabrication method of multiple nanopatterns in azopolymer film coated on flexible PET substrates by combining AT-NIL and photolithography. The phototunable mechanical properties of the azopolymer upon photoirradiation with different wavelengths enable the successful realization of multiple AT-NIL iterations, presenting angle-dependent structural-color images. This approach is robust and versatile, adaptable to many other substrates and light-active materials showing phototunable mechanical properties.
研究不足
The study does not explicitly mention limitations, but potential areas for optimization could include the resolution of the nanopatterns and the efficiency of the phototunable mechanical properties of the azopolymer under different photoirradiation conditions.