研究目的
Investigating the fabrication of silicon nanowires over micro-textured Si substrates using silver assisted electroless chemical etching to reduce solar weighted reflectance for potential solar cell applications.
研究成果
Binary textured structures successfully fabricated over P-type (100) oriented polished silicon can reduce reflectivity to <3% in a broad spectral range. The concentration of HF acid critically affects the morphology of the nanowires and the etch kinetics, allowing for the production of nanowires with desired orientation and optical reflectivity through a low-cost and scalable process.
研究不足
The study is limited to the effects of HF concentration on the morphology and optical properties of the fabricated structures. The potential for enhanced conversion efficiency through reduced reflectivity is noted, but the study does not fully explore the conversion efficiency implications.
1：Experimental Design and Method Selection:
Silver assisted electroless chemical etching route was adopted for fabrication of silicon nanowires. Influence of HF concentration on the formation kinetics was investigated.
2：Sample Selection and Data Sources:
Boron doped P-type, (100) oriented silicon wafers were used as substrates.
3：List of Experimental Equipment and Materials:
Field emission scanning electron microscopy (FE-SEM; Model: Zeiss, Supra 40 VP) was used to study morphology of samples. UV-VIS-NIR spectrophotometer was used to study optical characteristics.
4：Experimental Procedures and Operational Workflow:
Wafers were treated with acidic etchant, cleaned, subjected to micro-texturization, and then nano-texturization was carried out through silver assisted chemical etching with varying HF concentrations.
5：Data Analysis Methods:
Reflectance spectrum and solar weighted reflectance (SWR) were estimated in the spectral range 300-1100 nm.
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