研究目的
Investigating the possibilities of femtosecond laser micromachining of thin-film titanium coatings for elements of microelectronics and optoelectronics.
研究成果
Femtosecond laser radiation is a versatile tool for the formation and processing of microstructures, capable of depositing thin-film structures on various materials with high precision. The developed femtosecond laser complex allows for controlled micromachining tasks, including selective material removal and modification of the chemical and phase composition of the processed sample.
研究不足
The study is limited to the use of femtosecond laser micromachining for titanium thin films and does not explore other materials or laser systems. The precision of micromachining is constrained by the minimum width of the processed track without damaging the substrate surface.
1：Experimental Design and Method Selection:
The study used pulsed laser deposition in vacuum with a femtosecond Yb:KGW laser system for depositing thin-film titanium coatings on quartz substrates.
2：Sample Selection and Data Sources:
Titanium samples were used as the target material, and quartz glass was used as the substrate.
3：List of Experimental Equipment and Materials:
Femtosecond Yb:KGW laser system, vacuum chamber, quartz substrates, titanium target.
4：Experimental Procedures and Operational Workflow:
The laser radiation was focused onto the titanium target in a vacuum chamber, and the ablation products were deposited on the quartz substrate. The process parameters included laser beam speed, scanning duration, and distance from the sample to the substrate.
5：Data Analysis Methods:
The structure of the deposited titanium was analyzed to evaluate the homogeneity and particle size of the coating.
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