研究目的
Investigating the optical and structural properties of sputtered aluminum nitride films with controlled oxygen content to fabricate Distributed Bragg Reflectors for ultraviolet A.
研究成果
The study demonstrated the fabrication of DBRs with a single sputtering target for the UV-A spectrum region with negligible extinction coefficient. The refractive index of AlN films was successfully tuned by controlling the sputter gas flow rate ratio. The research provides insights into the effects of chemical and structural characteristics on the optical properties of AlN thin films and suggests further investigation into controlling thin film surface and interfacial roughness for improved DBR design.
研究不足
The study is limited by the systemic oxygen contribution to the deposition process, which may affect the film properties. The interfacial roughness and surface morphology evolution with increasing number of DBR pairs also pose challenges to achieving higher reflectivity.
