1：Experimental Design and Method Selection:

The study involved fabricating ridge optical waveguides on PLZT thin films using femtosecond laser ablation. The ablation threshold for different kinematic conditions and the ablation regimens for several fluences were studied to achieve smooth structures.

2：Sample Selection and Data Sources:

Pb0.91La0.09Zr0.65Ti0.35O3 thin films with a thickness of around 500 nm were prepared by the chemical solution deposition technique on SiO2/Si substrates.

3：91La09Zr65Ti35O3 thin films with a thickness of around 500 nm were prepared by the chemical solution deposition technique on SiO2/Si substrates. List of Experimental Equipment and Materials:

3. List of Experimental Equipment and Materials: A commercial Ti:sapphire ultrafast laser system (Spectra Physics Spitfire) working at 793 nm, a 10x microscope objective, a micrometer motorized station system (Newport, Inc), a HR2000+ spectrometer (OceanOptics, Inc.), a scanning electron microscope system (Quanta 200, Thermo Fisher Scientific), and a Thorlabs BC106N-VIS beam profiler analyzer were used.

4：Experimental Procedures and Operational Workflow:

The pulse energy was adjusted combining a half-wave plate plus a Glan polarizer and a neutral density filter. The laser was focused on the sample surface, and the morphology and roughness of ridge waveguides were characterized.

5：Data Analysis Methods:

The roughness measurement was obtained by an image post-processing of the top edge of the grooves. The spatial intensity distribution of modes was measured with a beam profiler analyzer.