摘要： We propose a type-II AlInN/ZnGeN2 quantum well (QW) structure serving as the active region for ultraviolet (UV) laser diodes. A remarkably low threshold current density can be achieved using the type-II AlInN/ZnGeN2 QW structure, providing a pathway for the realization of electrically-driven nitride-based semiconductor UV laser diodes. ZnGeN2 has both a very similar lattice constant and bandgap to GaN. Its large band offsets with GaN enable the potential of serving as a hole confinement layer to increase the electron-hole wavefunction overlap in the active region. In this study, we investigate the spontaneous emission and gain properties of type-II AlInN/ZnGeN2 QWs with different ZnGeN2 layer thicknesses. Our findings show that the use of ZnGeN2 layers in the active region provides a significant improvement in hole carrier confinement, which results in ～5 times enhancement of the electron-hole wave function overlap. Such an enhancement provides the ability to achieve a significant increase (～6 times) in the spontaneous emission rate and material gain, along with a remarkable reduction in threshold carrier density compared to the conventional AlGaN-based QW design, which is essential for practical UV laser diodes.