1：Experimental Design and Method Selection:

SnOx thin films were deposited on soda lime glass substrates using reactive E-beam evaporation technique at various oxygen pressures. The process was carried out at room temperature with a deposition rate of 1.5 ?/s.

2：5 ?/s. Sample Selection and Data Sources:

2. Sample Selection and Data Sources: Three different samples were grown at three different oxygen pressures (1.7 × 10^-4 mbar, 2.7 × 10^-4 mbar, and 3.7 × 10^-4 mbar) and for three different thicknesses.

3：7 × 10^-4 mbar, 7 × 10^-4 mbar, and 7 × 10^-4 mbar) and for three different thicknesses. List of Experimental Equipment and Materials:

3. List of Experimental Equipment and Materials: E-beam evaporation system, X-ray diffractometer (Rigaku Smartlab), atomic force microscope (AFM, Bruker), UV–Visible spectrophotometer (Agilent, Carry 5000).

4：0). Experimental Procedures and Operational Workflow:

4. Experimental Procedures and Operational Workflow: The substrates were cleaned and fitted onto a substrate holder inside the chamber, which was initially evacuated at 10^-6 mbar pressure. Oxygen gas was purged into the chamber during deposition. The structural, surface morphological, and optical properties of the films were characterized.

5：Data Analysis Methods:

XRD patterns were analyzed for structural properties, AFM for surface morphology, and UV–Visible spectrophotometry for optical properties. The absorption coefficient and band gap were calculated using standard formulas.