研究目的
Investigating the properties of pulsed laser deposited Ni60Ti40 shape memory thin films under various deposition conditions and understanding the dynamics of laser-produced plasma through fractal modeling.
研究成果
The study successfully demonstrated the controlled deposition of Ni60Ti40 shape memory thin films using PLD, with in-situ plasma monitoring providing insights into the deposition process. The fractal model effectively described plasma dynamics, correlating with experimental observations. Optimal deposition conditions were identified for stoichiometric transfer and minimal droplet formation.
研究不足
The study is limited by the complexity of controlling deposition parameters and the potential for non-uniformity in thin film composition and thickness. The fractal model's applicability to all plasma dynamics scenarios may also be a limitation.
1：Experimental Design and Method Selection:
Utilized pulsed laser deposition (PLD) with an Nd:YAG laser for thin film deposition. Implemented in-situ plasma monitoring via space- and time-resolved optical emission spectroscopy and ICCD fast camera imaging.
2：Sample Selection and Data Sources:
NiTi alloy (nitinol60) targets were used. Thin films were deposited at different distances (2 and 4 cm) and laser energies (40, 80, 100 mJ).
3：List of Experimental Equipment and Materials:
Nd:YAG laser, ICCD camera (PI MAX), SEM, AFM, EDS, XRD equipment, DSC Maya
4：Experimental Procedures and Operational Workflow:
2 Laser ablation of NiTi targets, plasma plume dynamics analysis, thin film deposition, and post-deposition annealing.
5：Data Analysis Methods:
Optical emission spectroscopy for plasma analysis, SEM and AFM for surface analysis, EDS for chemical composition, XRD for structural analysis.
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