1：Experimental Design and Method Selection:

The study used a homemade laser writer working at 405 nm to fabricate metamaterial structures on S1813 photoresist coated upon chromium on glass, followed by etching in the exposed regions.

2：Sample Selection and Data Sources:

Glass substrates were cleaned and coated with ~50 nm thick Chromium using DC magnetron sputtering, followed by coating of S1813 positive photoresist.

3：List of Experimental Equipment and Materials:

Homemade laser writer, scanning electron microscope (SEM), Optical Microscope, Fourier transform infrared spectroscopy (FTIR).

4：Experimental Procedures and Operational Workflow:

The fabrication process included cleaning the substrate, depositing Chromium, coating with photoresist, laser writing, development, etching, and lift-off.

5：Data Analysis Methods:

Structural characterization was performed using SEM and Optical Microscope, and absorption characteristics were analyzed using FTIR spectroscopy.