研究目的
Investigating the structural, chemical, and optical properties of epitaxial b-(Al,Ga,In)2O3 films grown via MOCVD and their application in UV photodetectors.
研究成果
The study demonstrated the tunability of bandgaps in b-(Al,Ga,In)2O3 films over a range of 1.5 eV, with corresponding shifts in photodetector wavelength selectivity. High responsivities and low NEP values were achieved, indicating potential for low-light sensing applications.
研究不足
The study did not systematically explore the complex interrelationships between process parameters and film properties. The optical spectroradiometer was insufficient for measuring bandgaps greater than 6 eV.
1:Experimental Design and Method Selection:
Epitaxial films were grown on (001) sapphire substrates using MOCVD. The compositions were determined using EDX and XPS. Optical properties were measured via UV-Vis spectroscopy. Structural characterization was performed using XRD, SEM, and AFM.
2:Sample Selection and Data Sources:
Five epitaxial films were investigated, including Ga2O3, (AlxGa1?x)2O3, and (InxGa1?x)2O
3:List of Experimental Equipment and Materials:
MOCVD system, XRD diffractometer, SEM, AFM, UV-Vis spectroradiometer, XPS spectrometer.
4:Experimental Procedures and Operational Workflow:
Films were grown at specific temperatures and pressures, characterized structurally and optically, and fabricated into photodetectors.
5:Data Analysis Methods:
Bandgaps were calculated using the Tauc relation from optical measurements. Compositions were determined from EDX and XPS data.
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