研究目的
Investigating the fabrication of hybrid silicon nanowire and nanohole arrays using laser interference lithography and metal-assisted chemical etching.
研究成果
A two-step method was proposed to fabricate controllable hybrid SiNW and SiNH arrays and even more complicated Si nanostructures. The method allows the efficient fabrication of hybrid SiNW and SiNH arrays in a controllable way, paving a way for potential applications in various fields such as solar cells, bioprobes, and biosensors.
研究不足
The preparation of metallic template for MACE is limited to the current nanofabrication methods, which are too complicated, time-consuming, and require strict experiment conditions.
1：Experimental Design and Method Selection:
Superlens-enhanced laser interference lithography (SELIL) was used to directly fabricate ordered Ag patterns and then used MACE to obtain hybrid SiNW and SiNH arrays.
2：Sample Selection and Data Sources:
Single-polished Si wafers (P-type, about 10 Ω cm, 500-μm thick) with (100) orientation were used as substrates.
3：List of Experimental Equipment and Materials:
A 1064 nm high power laser source, Ag films, HF/H2O2 etching solution, and a Quanta FEG 250 scanning electron microscope (SEM) for characterization.
4：Experimental Procedures and Operational Workflow:
Ag films were deposited on Si substrates, followed by laser interference lithography to create patterns, and then MACE was used to etch the Si substrates.
5：Data Analysis Methods:
SEM was used to characterize the surface and cross-sectional morphologies of the fabricated nanostructures.
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