研究目的
Investigating the wetting behavior and deposition formation in the course of drying and spreading of nano?uids, particularly containing surfactants, on hydrophobic surfaces.
研究成果
The study revealed that drying of surfactant-free quantum dot nano?uids undergoes four evaporation modes, including an additional pinning mode. Addition of nanoparticles to aqueous surfactant solutions leads to deterioration of the spreading rate and formation of a double co?ee ring. Superspreading was observed in the presence and absence of quantum dot nanoparticles, with different morphologies of co?ee rings on various substrates.
研究不足
The study is limited to specific types of nanoparticles (quantum dots) and surfactants (trisiloxane) on hydrophobic surfaces. The complexity of interactions between nanoparticles, surfactants, and substrates may not be fully captured.
1:Experimental Design and Method Selection:
The study involved experimental investigation of the evaporation dynamics of quantum dot-based nano?uids and evaporation-driven self-assembly in nanocolloidal suspensions on hydrophobic surfaces.
2:Sample Selection and Data Sources:
Hydrophobic surfaces were prepared by spin coating with hydrophobic polymers and by low-pressure chemical vapor deposition of silane. Quantum dots and trisiloxane surfactant were used in the experiments.
3:List of Experimental Equipment and Materials:
A droplet shape analyzer (Kru?ss DSA-100), a 3D confocal pro?ler (μSurf, NanoFocus Expert), and a spin coater (WS 400B 6NPP lite, Laurell Technologies) were used.
4:Experimental Procedures and Operational Workflow:
Droplets of nano?uids were deposited on hydrophobic surfaces, and their evaporation and spreading dynamics were recorded and analyzed.
5:Data Analysis Methods:
The droplet base diameter, contact angle, and volume time dependencies were processed with homemade software. The deposits left after droplet evaporation were investigated with a 3D confocal pro?ler.
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