研究目的
Investigating the temperature dependence of the polariton lasing threshold in an amorphous organic thin film to understand the anomalous high threshold and the role of energy relaxation bottlenecks.
研究成果
The study concludes that the polariton lasing threshold in TDAF increases at temperatures below 45 K due to inefficient relaxation along the LPB caused by lack of phonon scattering. Above 45 K, the threshold remains unchanged due to a balance between increased radiative pumping and decreased phonon-induced relaxation.
研究不足
The study is limited by the inefficiency of phonon scattering at low temperatures, leading to a bottleneck in polariton relaxation and increased lasing thresholds. The alignment of the LPB with vibronic or ASE peaks for more efficient relaxation was not fully explored.
1:Experimental Design and Method Selection:
The study involves a vertical optical microcavity with an amorphous organic thin film, investigating polariton lasing threshold and energy dispersion versus temperature.
2:Sample Selection and Data Sources:
The microcavity consists of a distributed Bragg reflector (DBR) with a 115 nm thick TDAF film.
3:List of Experimental Equipment and Materials:
Includes a DBR comprising SiNx/SiO2 pairs, TDAF film, ZnS/MgF2 DBR, optical parametric amplifier, spectrometer, and cryostat.
4:Experimental Procedures and Operational Workflow:
The sample was pumped non-resonantly at 370 nm, with angle-resolved PL collected and analyzed versus temperature.
5:Data Analysis Methods:
The PL intensity and FWHM were analyzed, and polariton population distributions were calculated using the coupled-oscillator model.
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