研究目的
Investigating the improved photovoltaic effect of p–i–n structured BiFeO3 film deposited by radio-frequency magnetron sputtering.
研究成果
The introduction of electron and hole transport materials in a p–i–n structure significantly improves the ferroelectric and photovoltaic properties of BiFeO3 films. The ferroelectric polarization plays a dominant role in the photovoltaic effect.
研究不足
The porosity and large clusters in BiFeO3 film lead to poor ferroelectric and photovoltaic properties in simple device structures.
1:Experimental Design and Method Selection:
Polycrystalline BiFeO3 film was deposited onto FTO substrate by RF magnetron sputtering method. The film was annealed and characterized for its structure and properties.
2:Sample Selection and Data Sources:
BiFeO3 film was deposited on FTO substrate, and devices with different structures were fabricated and tested.
3:List of Experimental Equipment and Materials:
RF magnetron sputtering system, FTO substrate, Ag top electrode, TiO2 film deposited by ALD, Spiro-MeOTAD as HTM.
4:Experimental Procedures and Operational Workflow:
Deposition of BiFeO3 film, annealing, fabrication of devices, measurement of hysteresis loops and J-V curves under illumination.
5:Data Analysis Methods:
Analysis of XRD patterns, SEM images, hysteresis loops, and photovoltaic responses.
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X-ray diffraction (XRD)
D/max 2500 PC
Rigaku Corporation
Analysis of crystal structure
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Field-emission scanning electron microscope (FESEM)
SUPRA 55
Carl Zeiss
Characterization of surface morphology
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Ferroelectric analyzer
RT6000HVS-Piezoelectric Test System
Radiant Technologies
Measurement of polarization-electric field hysteresis loop
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Keithley 2400 source meter
2400
Keithley
Investigation of photovoltaic response
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RF magnetron sputtering system
Deposition of BiFeO3 film
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FTO substrate
Substrate for film deposition
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Ag top electrode
Top electrode for device fabrication
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TiO2 film
Electron transport material
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Spiro-MeOTAD
Hole transport material
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