研究目的
Investigating the effect of oxygen incorporation on the valence band behaviour of ZrOx using X-ray Photoelectron Spectroscopy and Ultraviolet Photoelectron Spectroscopy.
研究成果
The study successfully used Auger transitions and valence band analysis to correct for charging effects in XPS spectra of ZrOx films. It demonstrated that the O2p band position remains constant with increasing oxygen content, providing a reliable reference for charge correction. The research also correlated core-level binding energy shifts with structural changes in ZrOx, offering insights into the electronic behaviour of zirconium under different oxidation states.
研究不足
The study is limited to zirconium oxide films and may not be directly applicable to other oxide families without further research. The method requires careful control of sample preparation and measurement conditions to avoid charging effects.
1：Experimental Design and Method Selection:
Combined X-ray Photoelectron Spectroscopy (XPS) and Ultraviolet Photoelectron Spectroscopy (UPS) to study ZrOx.
2：Sample Selection and Data Sources:
Thin film samples prepared with magnetron sputtering under different argon/oxygen atmosphere.
3：List of Experimental Equipment and Materials:
Hemispherical analyzer (Leybold EA10/100 MCD), non-monochromatized magnesium Kα X-ray source, helium discharge lamp (HeI =
4：2 eV), SIEMENS D5000 XRD instrument, Hitachi S-4800 field emission SEM. Experimental Procedures and Operational Workflow:
Samples transferred from plasma chamber to photo-electron spectrometer without breaking vacuum; core level and valence band spectra measured; deconvolution performed using Unifit software package.
5：Data Analysis Methods:
Analysis of Auger and valence band spectra to understand electronic behaviour and for charge correction of XPS spectra.
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