研究目的
Investigating the fabrication and characterization of high quality factor THz metasurfaces using femtosecond laser ablation.
研究成果
The study demonstrates the feasibility of using femtosecond laser ablation for the fabrication of high quality factor THz metasurfaces. The good agreement between experimental results and simulations suggests that this approach can be effectively used for designing optical devices with superior performances.
研究不足
The study focuses on the THz frequency range (0.3–1.5 THz) and uses specific materials (Au film on Si substrate). The fabrication techniques may have limitations in terms of resolution and scalability for other frequency ranges or materials.
1：Experimental Design and Method Selection:
The study employs femtosecond laser ablation (FLA) to fabricate metasurfaces (MSs) on a gold film over a silicon substrate. Two fabrication methods are used: discrete mode (DM) for creating arrays of through-holes and continuous mode (CM) for creating arrays of metallic islands.
2：Sample Selection and Data Sources:
Samples are an Au film (180 nm thickness) over an intrinsic (1 0 0) silicon substrate (400 μm thickness) with an intermediate CrNi layer (20 nm thickness) for improved adhesion.
3：List of Experimental Equipment and Materials:
Ti:Sa laser source (~35 fs, 800 nm), high precision three-axis stage, electromechanical shutter, plano-convex lenses (35 mm and 75 mm focal lengths), time-domain spectrometer (Tera-K15, Menlo Systems).
4：Experimental Procedures and Operational Workflow:
Laser pulses are used to perforate the metallic film or remove channels to create the desired patterns. The THz response is characterized using time-domain spectroscopy.
5：Data Analysis Methods:
Full-wave electromagnetic simulations (CST Microwave Studio) are used to predict and compare with experimental findings.
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