研究目的
To investigate the features of the formation of the dispersion of the complex dielectric constant of OSG thin films by the methods of broadband TDS-IR spectroscopy.
研究成果
The application of THz–IR spectroscopy to the study of two-layer structures with an organosilicate glass film enables not only the determination of the parameters of the resonance and relaxation absorption bands but also evaluation of the contribution of the metal sublayer using the Drude conductivity model in the overall response of the sample. This approach allows for the analysis of the relationship between the morphological and electrodynamic parameters of organosilicate glass films with low static values of permittivity.
研究不足
The study acknowledges discrepancies between experimental and calculated spectra, suggesting limitations in the accuracy of measurements and the need to account for additional relaxation mechanisms of absorption in the microwave region.
1：Experimental Design and Method Selection:
The study involved wide-range measurements of thin films of SiCxOyHz organosilicate glasses in the THz–IR range. The method included analyzing absorption bands and evaluating static conductivity using the Drude model.
2：Sample Selection and Data Sources:
Samples included dense and porous OSG films deposited on dielectric sapphire substrates and conductive layers of platinum and aluminum.
3：List of Experimental Equipment and Materials:
A Bruker IFS113v IR Fourier-transform spectrometer and a terahertz time-domain spectrometer (TDS) were used.
4：Experimental Procedures and Operational Workflow:
Reflection and transmission spectra were measured under specific conditions, including room temperature and residual pressure.
5：Data Analysis Methods:
The data were analyzed using the additive model of the classical oscillator to describe absorption bands and determine their parameters.
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