研究目的
Investigating the structural, optical, and electrical properties of Nd-doped BaSnO3 transparent thin films for potential applications in optoelectronic devices.
研究成果
The study successfully optimized the growth parameters for Nd-doped BaSnO3 thin films, achieving excellent structural, optical, and electrical properties. These films exhibit superior performance compared to other doped BaSnO3 films, making them promising candidates for transparent conductive applications in optoelectronic devices.
研究不足
The study focuses on the optimization of growth parameters for Nd-doped BaSnO3 thin films but does not explore the long-term stability or scalability for industrial applications.
1:Experimental Design and Method Selection:
The study employed pulsed laser deposition (PLD) to grow Nd-doped BaSnO3 thin films on SrTiO3 substrates, optimizing oxygen pressure, substrate temperature, and film thickness.
2:Sample Selection and Data Sources:
Double-side polished SrTiO3 (001) single-crystal substrates were used.
3:List of Experimental Equipment and Materials:
PLD apparatus with a KrF excimer laser, x-ray diffractometer, atomic force microscope, transmission electron microscope, physical property measurement system, UV-vis-NIR spectrophotometer.
4:Experimental Procedures and Operational Workflow:
Films were grown under varying oxygen pressures and substrate temperatures, followed by in situ annealing.
5:Data Analysis Methods:
XRD for structural analysis, AFM for surface morphology, TEM for microstructure, PPMS for electrical properties, and spectrophotometry for optical transmittance.
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Physical property measurement system
PPMS-9
Quantum Design
Used for measuring the carrier density, mobility, and resistivity of NBSO films.
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X-ray diffractometer
PANalytical X’Pert PRO
PANalytical
Used for characterizing the crystalline quality and epitaxial properties of NBSO films.
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Pulsed Laser Deposition (PLD) apparatus
Used for growing Nd-doped BaSnO3 thin films.
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KrF excimer laser
Part of the PLD apparatus for film deposition.
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Atomic force microscope
MFP-3D
Asylum Research
Used for measuring the surface morphology and roughness of NBSO films.
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Transmission electron microscope
Tecnai G2 F20 S-Twin
Used for characterizing the film thickness and microstructure near the interface region.
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UV-vis-NIR spectrophotometer
U-4100
Used for measuring the optical transmittance of NBSO films.
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