研究目的
Investigating the structural, electrical, and optical properties of copper oxide and copper-aluminum oxide thin films deposited by ultrasonic spray pyrolysis.
研究成果
The study successfully deposited and characterized copper oxide and copper-aluminum oxide thin films using ultrasonic spray pyrolysis. The films exhibited p-type conductivity, with electronic conductivity dependent on Cu2O content and increasing ionic conductivity with aluminum concentration. Optical band gap increased with aluminum concentration, and thermal annealing transformed the films into CuAl2O4 spinel structure.
研究不足
The study is limited by the deposition technique's room pressure conditions, which may affect film quality. The electronic conductivity of films with high aluminum content is relatively low, indicating potential limitations in certain applications.
1：Experimental Design and Method Selection
Copper oxide and copper-aluminum oxide thin films were deposited using ultrasonic spray pyrolysis. The films were characterized by XRD, SEM, EDS, Uv-vis Spectroscopy, IR, XPS, Hall Effect, and Seebeck Effect.
2：Sample Selection and Data Sources
Films were deposited on corning glass and quartz slices. Copper oxide films were deposited at temperatures ranging from 300 °C to 500 °C. Copper-aluminum oxide films were deposited at 350 °C with varying aluminum concentrations.
3：List of Experimental Equipment and Materials
Ultrasonic humidifier operating at 1400 kHz, D8 Advance ECO diffractometer, Jeol Scanning Electron Microscope (SEM; JSM-6390 model), EDS (Inca X-sight from Oxford Inst., 7852 model), Varian Cary 50 Conc spectrophotometer, Spectrum One FT-IR spectrometer, K-alpha Thermo Fischer Scientific spectrometer for XPS, ECOPIA HMS-3000 Hall Effect measurement system, Dektak3 surface profilometer system.
4：Experimental Procedures and Operational Workflow
Films were deposited using a molten tin bath with controlled temperature. Deposition times varied with temperature. Post-deposition, films were annealed at 800 °C in an Ar atmosphere for 4 hours.
5：Data Analysis Methods
XRD patterns were refined using the Le Bail method. Optical properties were analyzed using Uv-vis spectroscopy. Electrical properties were measured using Hall Effect and Seebeck coefficient measurements.
独家科研数据包，助您复现前沿成果，加速创新突破
获取完整内容-
FT-IR spectrometer
Spectrum One
Perkin Elmer
Used for the analysis of stoichiometry.
-
X-ray Photoelectron Spectrometer
K-alpha
Thermo Fischer Scientific
Used for valence band analysis.
-
Surface profilometer system
Dektak3
Veeco
Used to measure the thickness of all the films.
-
Scanning Electron Microscope
JSM-6390
Jeol
Used to study the surface morphology and elemental composition of the films.
-
Energy Dispersive Spectrometer
Inca X-sight
Oxford Inst.
Used for elemental composition analysis.
-
Ultrasonic humidifier
1400 kHz
Used to get the mist of the chemical solutions that led to the solid films.
-
D8 Advance ECO diffractometer
Bruker
Used for powder X-ray diffraction data collection.
-
Spectrophotometer
Cary 50 Conc
Varian
Used for optical characterization (%T and Absorbance).
-
Hall Effect measurement system
HMS-3000
ECOPIA
Used for electrical characterization.
-
登录查看剩余7件设备及参数对照表
查看全部
