研究目的
To develop a side-entry specimen holder capable of applying a 0.5-tesla in-plane magnetic-induction field for in-situ transmission electron microscopy and to observe magnetization reversal in Nd-Fe-B magnets.
研究成果
The holder was shown to be useful for analysis of magnetization-reversal behaviors of hard magnetic materials. Magnetization reversal within a Nd-Fe-B sintered magnet in-situ was observed. The nucleation and propagation of DWs from the saturated state were observed under a field of hundreds of millitesla.
研究不足
The gap field cannot be measured directly. The coil unit is not cooled, considerable degas (associated with joule heating) occurred from the polyamide coating layer of the magnetic wires when Im>350 mA.
1:Experimental Design and Method Selection:
The holder integrates three stacked electromagnets with 180-μm gap length to deflect electrons back in parallel to the optical axis. A specimen prepared by FIB was positioned in the gap by using an AFM cantilever.
2:Sample Selection and Data Sources:
A polycrystalline Nd-Fe-B sintered magnet (with coercivity of 1.1 T) was in-situ observed.
3:1 T) was in-situ observed.
List of Experimental Equipment and Materials:
3. List of Experimental Equipment and Materials: The holder consists of three miniaturized electromagnets with 300 × 300-μm pole area and 180-μm pole gap. A 40-μm-wide cantilever commercially available for atomic force microscopy (AFM) was used to position the specimen.
4:Experimental Procedures and Operational Workflow:
The specimen was in a thermally demagnetized state at the beginning of the observation. A positive field up to 0.2 T was applied until the specimen reached magnetic saturation, and then the field was reduced to zero and turned negative.
5:2 T was applied until the specimen reached magnetic saturation, and then the field was reduced to zero and turned negative.
Data Analysis Methods:
5. Data Analysis Methods: Magnetic-field magnitude was determined on the basis of experimentally measured electron-deflection angles and induction-field profiles along the electron-beam path calculated by finite element electromagnetic simulation.
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