研究目的
Investigating the interaction of powerful sub-terahertz radiation with expanding highly inhomogeneous plasma of vacuum arc discharge to create a point source of extreme ultraviolet radiation for high-resolution projection lithography.
研究成果
The tantalum plasma of the vacuum arc discharge has significant luminosity itself in the extreme ultraviolet range. The additional heating of the plasma by the sub-terahertz radiation of the gyrotron shifts the emission spectrum of the plasma toward smaller wavelengths.
研究不足
The minimum value of the vacuum arc discharge current is due to technical limitations of the power supply used. An increase in the heating power above 200 kW leads to a decrease in the luminosity of the plasma in the short-wavelength region.
1：Experimental Design and Method Selection:
The study involved the interaction of sub-terahertz radiation with vacuum arc discharge plasma. A gyrotron was used as the source of sub-terahertz radiation.
2：Sample Selection and Data Sources:
Tantalum plasma from a vacuum arc discharge was used.
3：List of Experimental Equipment and Materials:
A gyrotron with an output power of up to 250 kW, a wavelength of
4：2 mm, and a vacuum arc plasma source. Experimental Procedures and Operational Workflow:
The gyrotron radiation was focused into a spot with a diameter of
5：5 mm. The plasma density was controlled by varying the vacuum arc discharge current. Data Analysis Methods:
Spectral characteristics of plasma emission were measured by an absolutely calibrated silicon detector and determined with the help of double filters.
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