摘要： High-productivity regime of nanosecond IR-laser ablative generation of silicon colloidal solutions in water for anti-bacterial applications was found in terms of GW/cm2-level laser intensity and scanning velocity by measuring multi-shot ablative mass loss and extinction coefficients of the colloids as sub-linear and third-power intensity functions, respectively. This advantageous regime implies sub-linear mass loss versus laser intensity at the simultaneous third-power yield of nanoparticles, resulting from the subcritical-density, opaque ablative plasma regulating the sample ablation rate and the related plasma-mediated dissociation (dispergation) of the ablation products. In contrast, at higher intensities, there is a drastic increase in mass loss with the corresponding increased yield of (sub) micrometer-sized particles owing to intense plasma-driven expulsion of micro-scale melt droplets and the corresponding saturation of the extinction coefficient of the colloidal solutions because of their dynamic local “self-limiting” effect during the high-rate ablation. The optimal low-intensity regime for Si nanoparticle production demonstrates the monotonous correlated increase of mass loss and extinction coefficient in terms of increasing laser scanning velocity, indicating the diminished cumulative effects. Surface coatings prepared from the generated Si nanoparticles exhibit minor surface oxidation, as acquired as their elemental composition via energy-dispersive X-ray spectroscopy, making their contact angle for water droplets (≈51°) close to that of bare Si wafer (≈58°) with its nanometer-thick native oxide layer. Owing to good wetting, the nanoparticle-based surface coatings show strong antibacterial response regarding Gram-negative Pseudomonas auereginosa bacteria even despite their minor oxidative passivation.