研究目的
Investigating the interface states in bilayer graphene encapsulated by hexagonal boron nitride and their impact on transport gap values.
研究成果
The study confirms that encapsulating graphene with hexagonal boron nitride protects its pristine quality, leading to transport gap values close to theoretical expectations. The method provides reliable information on band gaps and interface states, applicable to other high quality semiconductors.
研究不足
The study focuses on bilayer graphene encapsulated by hexagonal boron nitride, and the findings may not be directly applicable to other materials or configurations. The estimation of interface states assumes certain conditions that may not hold in all scenarios.
1:Experimental Design and Method Selection:
Conductivity of bilayer graphene encapsulated by hexagonal boron nitride was measured as a function of back and top gates, using another bilayer graphene as a top gate.
2:Sample Selection and Data Sources:
High quality double bilayer graphene heterostructures with hexagonal boron nitrides dielectrics were used.
3:List of Experimental Equipment and Materials:
Bilayer graphene, hexagonal boron nitride, Si substrate, low-current lock-in technique.
4:Experimental Procedures and Operational Workflow:
Conductivity was measured as a function of VBG and VTG at T =
5:5 K. Data Analysis Methods:
Transport gap values were extracted assuming zero interface trap states, and an average density of interface states per energy within a band gap (Dit) was estimated from discrepancies.
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