摘要： The influences of annealing temperature and ambient on surface chemistry, microstructure, morphology and electrical characteristics of Tin Oxide (SnO2)/Si heterojuctions are systematically identified. Metallic and oxygen deficient SnO2-x bonds have been consistently treated to stoichiometric SnO2 with annealing temperatures up to 600 0C in nitrogen environment. It has been observed that further increase in the annealing temperature causes the formation of the silicate layer. Presence of hydrogen in forming gas environment causes formation of the oxygen deficient SnO2-x, while the presence of the oxygen contributes to the formation of the stoichiometric SnO2 layer in oxygen annealing ambient. Parasitic phases significantly affect the crystalline structure of the films. Surface roughness of the samples decreases up to 1.02 nm which is strongly correlated with stress and strain on the film. On the other hand, oxidations of the dangling bonds and/or hydrogen diffusion cause variations in the total dipole moments which significantly change the capacitance. Depending on the annealing parameters, effective charge densities and interface trap densities decrease to 1011 cm-2, while the ideality factor and barrier potential are improved to 1.43 and 0.59 eV, respectively. Owing to the crystallization of the SnO2 layer, leakage current increase at low temperature annealing. However, passivation of the dangling bonds becomes more effective than phase crystallization at higher temperatures on the leakage characteristics. The current study shows that any changes in the surface chemistry directly affect the device performance.